In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 11R ( 1997-11-01), p. 6946-
Kurzfassung:
The deposition characteristics of (Ba, Sr)TiO 3 (BST) thin films using a liquid source metal-organic chemical vapor deposition on a 6-inch-diameter Pt/SiO 2 /Si wafer were investigated. Ba(DPM) 2 tetraglyme, Sr(DPM) 2 tetraglyme and Ti(DPM) 2 (O-i-Pr) 2 , dissolved in n-butyl acetate, were used as the sources of Ba, Sr and Ti, respectively. Step coverage, within-wafer uniformities in composition and thickness of the BST films were investigated as a function of substrate temperatures ranging from 420° C to 570° C. As the substrate temperature decreased, the step coverage improved, whereas the within-wafer uniformities degraded. From BST films deposited in a temperature range from 450° C to 480° C, good step coverage ( 〉 80%), as well as good within-wafer uniformity were obtained. However, in that temperature range, hazy deposition was observed due to many humps on the surface. The humps are an agglomeration of crystalline grains and are a few hundred Å in diameter, which have a Ti-rich composition compared to flat film region.
Materialart:
Online-Ressource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.6946
Sprache:
Unbekannt
Verlag:
IOP Publishing
Publikationsdatum:
1997
ZDB Id:
218223-3
ZDB Id:
797294-5
ZDB Id:
2006801-3
ZDB Id:
797295-7
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