In:
Applied Physics Letters, AIP Publishing, Vol. 61, No. 3 ( 1992-07-20), p. 261-263
Abstract:
Quadrupole mass spectroscopy has been used to resolve the energy distributions of O2+ on the substrate plane of a parallel plate reactive ion etching reactor. Energy spectra show pronounced structures caused by charge exchange collisions in the plasma sheath in combination with rf modulation. Additionally, continuous distributions are found which are attributed to the effect of elastic scattering of ions.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
1992
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
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