In:
ECS Transactions, The Electrochemical Society, Vol. 33, No. 5 ( 2010-10-01), p. 295-299
Abstract:
Thin film transistors (TFTs) with nitrogen incorporated indium zinc tin oxide (IZTO:N) channel layer were fabricated and characterized. For the IZTO:N channel, TFTs was fabricated on heavily doped Si as a common gate electrode and silicon nitride (SiNx) was used as a gate dielectric layer. The IZTO:N layer was formed by spin-coating as precursor type solution and annealed at 600C. The precursors for indium, zinc, and tin were indium chloride, zinc chloride, and tin chloride. The incorporation of nitrogen was accomplished by addition of NH4OH solution. The IZTO:N TFT prepared with the precursor solution having 0.7% NH4OH has show the performance in mobility 1.2cm2/Vs, Ion/off of 10^6 and threshold voltage of 8.5V.
Type of Medium:
Online Resource
ISSN:
1938-5862
,
1938-6737
Language:
Unknown
Publisher:
The Electrochemical Society
Publication Date:
2010
Bookmarklink