In:
Journal of Materials Chemistry C, Royal Society of Chemistry (RSC), Vol. 11, No. 4 ( 2023), p. 1320-1328
Abstract:
Ultraviolet laser is an indispensable technology applied in the fields of photolithography, micromachining, and laser prototyping. To date, only β-BaB 2 O 4 and CsLiB 6 O 10 are commercially available for direct fourth harmonic generation (266 nm) output of a fundamental wavelength (1064 nm). However, they suffer from the drawbacks of large walk-off angles or highly hygroscopic nature, respectively. Herein, the crystal growth, physical properties, and 266 nm laser generation of Rb 3 Ba 3 Li 2 Al 4 B 6 O 20 F (RBLABF) were systematically evaluated. The results indicate that RBLABF can be grown as high-quality and large-size single crystals. Also, it exhibits excellent comprehensive performances, i.e. , non-deliquescence, moderate birefringence (0.06@532 nm), short phase-matching wavelength (262 nm), large NLO coefficient (0.46 pm V −1 ), small walk-off angle (0.74°@532 nm) and large acceptance angle (10.56 mrad mm@532 nm), small anisotropic thermal expansion, and desirable specific heat and thermal conductivity. More importantly, the 266 nm laser was successfully output through an RBLABF crystal device. These make RBLABF a competitive UV NLO crystal for 266 nm laser generation.
Type of Medium:
Online Resource
ISSN:
2050-7526
,
2050-7534
Language:
English
Publisher:
Royal Society of Chemistry (RSC)
Publication Date:
2023
detail.hit.zdb_id:
2702245-6
Bookmarklink