In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 12R ( 1999-12-01), p. 6735-
Abstract:
The effect of xenon (Xe) gas addition to a discharge-pumped ArF excimer laser was examined.
When the partial pressure of the Xe gas was changed over a wide range, the output energy of the ArF excimer laser was found to become maximum at the Xe partial pressure of 20 mTorr and to be about
three times higher than that without Xe addition. It was shown that Xe gas addition was effective in increasing the initial electron density which was produced in the preionization process, and that the
increase of the initial electron density then produced a tendency to make the main discharge in the laser uniform in the direction of the optical axis.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.6735
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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