In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 34, No. 5R ( 1995-05-01), p. 2447-
Abstract:
Strontium titanate thin films have been prepared on Pt-coated and p-type bare Si(100) substrates by a pulsed laser deposition technique. Both the substrate temperature and the oxygen pressure substantially affected the crystal structure, microstructure and texture characteristics of the SrTiO 3 films. The (110)-textured films were obtained at 650° C under oxygen pressure of 1 mbar. The apparent dielectric constants increased with the thickness of the films and was accounted for by the formation of the low-dielectric-constant interacting layer, which was connected with the SrTiO 3 films in series. The true dielectric constant of the (110)-textured SrTiO 3 films was estimated to be K STO =239 (100 kHz).
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.34.2447
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1995
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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