In:
Materials Science Forum, Trans Tech Publications, Ltd., Vol. 544-545 ( 2007-5), p. 829-832
Abstract:
Recently, the micro-column has been intensively studied as a potential candidate for
next-generation lithography with high-throughput capability. The micro-column has a simple structure with an electron emitter, micro-lenses, a double octupole deflector, and an Einzel lens. The
structure and performance of the micro-column are dependent on the characteristics of the electron emitter. The electron emitter should have several prerequisites such as stable emission of electrons,
high brightness and long lifetime. It is also necessary for the emitted electrons to have sufficiently low kinetic energy, which can be achieved by using a very sharp emission tip. In this work, we made an
extremely sharp tip by electro-chemically etching the tungsten wire in 10 % KOH solution. From the Fowler-Nordheim plot, the effective radius of the tip was found to be as small as ~12 nm, which is
consistent with the value measured by SEM. We also discovered that the stability of emission can be enhanced very much through thermal treatment of the tip end by irradiating the Nd:YAG laser pulse
Type of Medium:
Online Resource
ISSN:
1662-9752
DOI:
10.4028/www.scientific.net/MSF.544-545
DOI:
10.4028/www.scientific.net/MSF.544-545.829
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2007
detail.hit.zdb_id:
2047372-2
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