In:
Journal of Applied Physics, AIP Publishing, Vol. 85, No. 6 ( 1999-03-15), p. 3175-3179
Abstract:
The optimal reflectivity of soft-x-ray multilayers made of new pairs of materials was theoretically calculated in the wavelength range of 2.0–4.5 nm. Molybdenum and silicon dioxide were then selected for “high index” and “low index” layer, respectively, in the multilayer system. The microstructures and composition profiles of multilayers of molybdenum and silicon dioxide were investigated by means of low-angle x-ray diffraction, cross-sectional high resolution electron microscopy, an energy-filtering transmission electron microscope elemental mapping, and Auger electron spectrometry. The results show that no diffusion of Si into Mo layers has occurred, and only slight diffusion of O into Mo layers are seen. Sharp and relatively smooth interfaces have formed. With increasing number of layers, the interfacial roughness was propagated through the multilayer stack and low-frequency roughness increases while the high-frequency roughness decreases.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
1999
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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