In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 32, No. S1 ( 1993-01-01), p. 261-
Abstract:
For growth of GaAlSb layers by MBE method, the new doping Ga 2 Se 3 and Ga 2 S 3 sources have been used for Se and S doping respectively. The electrical transport measurements (Hall effect and resistivity) were used to characterise the grown layers. For GaSb:S layer the role of the two-dimensional electron gas is demonstrated. The Se-donor states in AlSb have been studied and its ionization energy was found to be about 440 meV.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.7567/JJAPS.32S1.261
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1993
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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