In:
Journal of Applied Physics, AIP Publishing, Vol. 86, No. 5 ( 1999-09-01), p. 2393-2396
Abstract:
Electron-beam (EB) irradiation on rf-sputtered silicate glass thin films can produce second-order nonlinearity. EB-poled germanosilicate glass film shows a maximum nonlinear optical (NLO) coefficient of d33=0.33 pm/V. It is found that the nonlinearity is homogeneous throughout the film layer and depends on both the EB current and dose. Moreover, a NLO grating, i.e., χ(2) grating, is realized using a periodic EB writing technique.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
1999
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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