In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 33, No. 7S ( 1994-07-01), p. 4181-
Abstract:
The CF, CF 2 and CF 3 radical and F atom densities and the polymerization were investigated in an on-off modulated CHF 3 electron cyclotron resonance plasma. Using infrared diode laser absorption spectroscopy, the remarkable changes of the CF X ( X =1–3) radical densities were observed by varying duty cycle at microwave powers of more than 300 W. The mechanisms of these behaviors of CF X ( X =1–3) radical densities were discussed on the basis of the results of the dissociation degree of the CHF 3 molecule. The polymer deposition rates on Si and SiO 2 surfaces were also investigated, and it was found that the CF 2 radical contributed greatly to the growth of polymer films. Furthermore, X-ray photoelectron spectroscopy measurement showed that the -CF 2 component in the polymer films decreased markedly and the -C-CF X component increased as the CF 2 radical density in the plasma decreased.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.33.4181
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1994
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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