In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 40, No. 10R ( 2001-10-01), p. 6055-
Abstract:
We evaluate the quantum yield of SiO 2 decomposition caused by electron-beam irradiation from the tip apex of a scanning tunneling microscope over an electron energy range of 10–180 eV and find onsets at 40 and 120 eV. These onsets are close to those found previously for electron-beam induced SiO 2 dissociation by Auger electron spectroscopy and electron stimulated desorption. Based on the excitation function, we consider that the decomposition is activated by core level excitations like the Knotek–Feibelman mechanism.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.40.6055
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2001
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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