In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 40, No. 4B ( 2001-04-01), p. L398-
Abstract:
We have investigated the stability of the morphologies of obliquely deposited TiO 2 thin films against annealing and humidity. For the thin films with closely distributed columns, the thickness decreases by more than 10% by annealing at 500°C, and the columnar structure is destroyed by exposure to hot water vapor. However, the thin films with isolated columns show no significant change in the thickness and morphology. This can be understood in terms of the stress induced in the thin films with columns which are in contact or isolated. The stable morphologies of the thin films with isolated columns and their shape-related functions are useful for devices that require thermal processing and those used under humid conditions.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.40.L398
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
2001
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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