In:
Journal of Applied Physics, AIP Publishing, Vol. 52, No. 7 ( 1981-07-01), p. 4772-4774
Abstract:
A planar magnetron with a zinc target is used to sputter zinc oxide in an oxygen atmosphere. Highly oriented zinc oxide films are obtained on a variety of subtrates such as gold, aluminum, platinum, quartz, and oxidized silicon. The sputtering rate is typically 10–20 μm/h for a substrate temperature of 450–500 °C, a substrate-to-target spacing of 4–7 cm, an oxygen partial pressure of 7 μm, and an input rf power of 1–1.25 kW. The films are evaluated by acoustic measurements, x-ray diffraction, reflection electron diffraction, and scanning electron microscopy.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
1981
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
Bookmarklink