In:
Surface Science Spectra, American Vacuum Society, Vol. 2, No. 3 ( 1993-07-01), p. 184-194
Abstract:
X-ray photoemission spectra of the core levels of passive films for an amorphous Al90Fe7Ce3 alloy ribbon are presented. Passive films were induced by anodizing below the pitting potential in an aqueous 0.9 wt % NaCl solution for 60 min using potentiodynamic polarization techniques. Survey scan (with pass energy of 89.45) and medium resolution multiplexes (with pass energy of 35.75 eV) of the C 1s, O 1s, Na 1s, and KL1L2,3 (Auger line), Al 2p, Cl 2s, 2p, and LM2,3M2,3 (Auger line), Fe 2p, 3s, and 3p, and Ce 3d and 4p photoelectron lines were collected on a Perkin-Elmer/Physical Electronics model # 5400 photoelectron spectrometer using monochromatized Al x rays. For comparison purposes, spectra of the native oxide film chemistry prior to anodization have been published previously [A. N. Mansour, S. J. Poon, Y. He, and G. J. Shiflet, Surf. Sci. Spectra 2, 31 (1993)]. Analysis of XPS data for the potentiodynamically anodized surface reveals the following conclusions: (i) the Fe and Ce concentrations of the passive film region have increased significantly from those of the bulk indicating segregation of both Fe and Ce from the bulk of the alloy into the passive film region, (ii) the chemistry of Fe in the passive film is similar to that of Fe in Fe2O3 or FeOOH, (iii) the chemistry of Ce in the passive film region is similar to that of Ce in Ce2O3, or Ce(OH)3, (iv) the chemistry of Al in the passive film is similar to that of an aluminum oxyhydroxide, namely AlOx(OH)y, (v) Cu is observed as a contaminant originating from the copper wheel used as part of the melt-spinning apparatus employed in manufacturing these alloys and is present in the passive region as Cu in Cu2O, and (vi) both Na and Cl were present in the passive film region indicating their incorporation in the passive film during the potentiodynamic polarization treatment.
Type of Medium:
Online Resource
ISSN:
1055-5269
,
1520-8575
DOI:
10.1116/1.1247698.N0009001
DOI:
10.1116/1.1247698.N0009002
DOI:
10.1116/1.1247698.N0009003
DOI:
10.1116/1.1247698.N0009004
DOI:
10.1116/1.1247698.N0009005
DOI:
10.1116/1.1247698.N0009006
DOI:
10.1116/1.1247698.N0009007
DOI:
10.1116/1.1247698.N0009008
DOI:
10.1116/1.1247698.N0009009
DOI:
10.1116/1.1247698.N0009010
Language:
English
Publisher:
American Vacuum Society
Publication Date:
1993
detail.hit.zdb_id:
2008474-2
SSG:
11
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