In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 4A ( 1999-04-01), p. L395-
Abstract:
The microstructure of a carbon nitride (CN x ) film formed
by ion-beam-assisted deposition (IBAD) was investigated by transmission electron microscopy (TEM). This film was formed on
the Si (100) substrate by IBAD with an N/C transport ratio of 1. Three different spacings (0.34 nm, 0.21 nm, 0.12 nm) were observed
by transmission electron diffraction (TED) and the periodic structure corresponding to the spacing of 0.34 nm was aligned
perpendicular to the substrate. The bending of this plane resembled a carbon nanotube; therefore, it seemed reasonable to suppose that
the CN x film obtained consisted of numerous carbon-nanotube-like
structural elements grown vertically, relative to the substrate, and it also seemed appropriate that these structural elements
should be termed nanotube-like carbon nitride.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.L395
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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