In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 21, No. 10R ( 1982-10-01), p. 1421-
Abstract:
The various possible growth models for thermal faceting of emitters of Ni 4 Mo alloy in a field-ion microscope were considered. The most likely growth mechanism was found for the particular faceting correlated with the six variants of the ordered phase at the surface–order faceting which occurred at 940–870 K (0.83–0.77 T c ) of in situ annealing, and for the faceting with FCC configuration–disorder faceting which occurred in either condition, i.e. at higher and lower temperature (1.14–0.98 T c and 0.68 T c ). Order faceting is by the following mechanism: (i) the preferential nucleation of a particular orientation variant of the ordered Ni 4 Mo phase in the surface area corresponding to each {751} FCC type plane, and (ii) simultaneous and cooperative growth of the nucleated ordered phase and the flattenins of each {211} BCT type plane which is parallel to the {751} FCC type plane.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.21.1421
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1982
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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