In:
Journal of Applied Physics, AIP Publishing, Vol. 103, No. 4 ( 2008-02-15)
Abstract:
We report on low frequency noise and field-effect mobility in strained-Si surface n-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) grown on relaxed virtual substrates with a Ge concentration varying between 0% and 30%. An increased Ge concentration results in higher intrinsic field-effect mobility, increasing from 380cm2V−1s−1 for the unstrained channel to 865cm2V−1s−1 for the strained-Si MOSFET on 30% relaxed SiGe virtual substrate. However, the higher mobility is traded off for increased substrate leakage currents and increased 1∕f (flicker) noise. It is suggested that flicker noise is due to traps in the oxide layer. The density of traps increases from 2×1017eV−1cm−3 for 0% Ge to 2.3×1018eV−1cm−3 for the 30% Ge virtual substrate.
Type of Medium:
Online Resource
ISSN:
0021-8979
,
1089-7550
Language:
English
Publisher:
AIP Publishing
Publication Date:
2008
detail.hit.zdb_id:
220641-9
detail.hit.zdb_id:
3112-4
detail.hit.zdb_id:
1476463-5
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