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  • 1
    In: Journal of Applied Physics, AIP Publishing, Vol. 129, No. 18 ( 2021-05-14)
    Abstract: Films of Ga2O3 were grown by Halide Vapor Phase Epitaxy (HVPE) on bulk heavily B-doped (001)-oriented diamond substrates using thin interlayers of Al2O3 deposited by HVPE or AlN/AlGaN deposited by metalorganic chemical vapor deposition. The growth with AlN/AlGaN was dominated by the formation of a highly conducting ɛ-phase with poor crystalline quality. For these samples, excessive leakage of Schottky diodes and of the Ga2O3/diamond heterojunction prevented meaningful electrical characterization. The film grown with the Al2O3 interlayer was mainly composed of (−201) β-Ga2O3 with an admixture of the ɛ-phase. The film had a low density of residual shallow donors, 5 × 1015 cm−3, with deep electron traps spectra consisting of the well documented centers for β-Ga2O3 near Ec 0.27, Ec 0.7, and Ec 1 eV, all of which are often ascribed to native defects or their complexes. The electrical properties of heterojunctions were mostly determined by the properties of the Ga2O3 films. Both Schottky diodes and heterojunctions showed measurable photosensitivity for 259 nm wavelength excitation, but very low photocurrent for near-UV (365 nm wavelength excitation).
    Type of Medium: Online Resource
    ISSN: 0021-8979 , 1089-7550
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2021
    detail.hit.zdb_id: 220641-9
    detail.hit.zdb_id: 3112-4
    detail.hit.zdb_id: 1476463-5
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  • 2
    In: Crystals, MDPI AG, Vol. 13, No. 9 ( 2023-09-20), p. 1400-
    Abstract: In this study, the results of hydrogen plasma treatments of β-Ga2O3, α-Ga2O3, κ-Ga2O3 and γ-Ga2O3 polymorphs are analyzed. For all polymorphs, the results strongly suggest an interplay between donor-like hydrogen configurations and acceptor complexes formed by hydrogen with gallium vacancies. A strong anisotropy of hydrogen plasma effects in the most thermodynamically stable β-Ga2O3 are explained by its low-symmetry monoclinic crystal structure. For the metastable, α-, κ- and γ-polymorphs, it is shown that the net result of hydrogenation is often a strong increase in the density of centers supplying electrons in the near-surface regions. These centers are responsible for prominent, persistent photocapacitance and photocurrent effects.
    Type of Medium: Online Resource
    ISSN: 2073-4352
    Language: English
    Publisher: MDPI AG
    Publication Date: 2023
    detail.hit.zdb_id: 2661516-2
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  • 3
    Online Resource
    Online Resource
    The Electrochemical Society ; 2021
    In:  ECS Meeting Abstracts Vol. MA2021-01, No. 56 ( 2021-05-30), p. 1475-1475
    In: ECS Meeting Abstracts, The Electrochemical Society, Vol. MA2021-01, No. 56 ( 2021-05-30), p. 1475-1475
    Abstract: Miniature O 2 sensors with low energy consumption are of practical interest for the chemical and metallurgical industries, development of systems for analyzing the performance of internal combustion engines and as functional elements of artificial lung ventilation devices. The requirements for miniaturization, high sensitivity, speed and relative cheapness are satisfied by O 2 sensors based on β-Ga 2 O 3 . The chemical and thermal stability of β-Ga 2 O 3 allows developing gas sensors with extremely high operating temperatures of 400-1100 °C ensuring high reproducibility of their characteristics and high speed of operation. In turn, the high operating temperatures of O 2 β-Ga 2 O 3 sensors are their drawback causing high energy consumption. Previously, we studied the effect of H 2 on the gas-sensitive properties of the α-Ga 2 O 3 /ε-Ga 2 O 3 structure with Pt contacts grown by the halide vapor phase epitaxy (HVPE) on the patterned sapphire substrates (PSS) [1]. Low operating temperatures, weak dependence of properties on the humidity and control of selectivity by means of voltage changes indicate that the research of α-Ga 2 O 3 /ε-Ga 2 O 3 structures as sensitive elements of gas sensors is promising. We presume that in addition to increasing the applied voltage to the structures, the sensitivity of α-Ga 2 O 3 /ε-Ga 2 O 3 to certain gases, in particular O 2 can be increased by reducing the level of doping with a donor impurity. Thus this work is devoted to research the effect of O 2 on gas-sensitive properties of α-Ga 2 O 3 /ε-Ga 2 O 3 structures doped with Sn. Ga 2 O 3 films were grown by the HVPE in Perfect Crystals LLC. PSS of (0001) orientation and 430 microns in thickness were used as substrates. During the synthesis, the films were doped with Sn. To measure the gas-sensitive properties of the α-Ga 2 O 3 /ε-Ga 2 O 3 structures Pt contacts were formed on their surface. The samples consisted of a mixture of α and ε phases with the orientation (0001). Using scanning and transmission electron microscopy, it was found that the α-phase forms columnar structures at the top of the sapphire cone, and the ε-phase fills the gaps between the columns. The characteristic triangular shape of columnar structures indicates that they consist of α-Ga 2 O 3 with trigonal symmetry. ɛ-Ga 2 O 3 has a grain but not polycrystalline structure taking into account the XRD results. Figure 1 shows the I-U characteristics of α-Ga 2 O 3 /ε-Ga 2 O 3 structures at the exposure of O 2 in a wide range of concentrations C O2 from 2 to 100 % at temperature T = 200 °C. The current through the samples decreases with C O2 increasing. In the range of the T = 180 - 200 °C, at T = 200 °C, the highest response to O 2 are observed. It is worth noting that the operating temperatures of the α-Ga 2 O 3 /ε-Ga 2 O 3 structures in the reaction to O 2 are significantly lower than the operating temperatures of O 2 β-Ga 2 O 3 sensors. These low values of T are an advantage in developing gas-analytical systems with low energy consumption. The concentration dependences of the response at the T = 180 - 200 °C are approximated fairly accurately by a power function : response ~ C O2 b , where b is the exponent that depends on the temperature. Figure 1-Effect of O 2 on I-U characteristics of α-Ga 2 O 3 /ε-Ga 2 O 3 . A decrease in the Sn impurity concentration in α-Ga 2 O 3 /ε-Ga 2 O 3 from ~4×10 18 cm -3 to ~1.5×10 17 cm -3 leads to a significant sensitivity to O 2 in the temperature range from 180 to 220 °C at low values of the applied voltage U ≤ 7.5 V. The I - U characteristics of α-Ga 2 O 3 /ε-Ga 2 O 3 structures in a dry gas mixture N 2 + O 2 are described by the model of MSM structures based on the theory of thermoelectronic emission in diode approximation with the resistance of the semiconductor layer exceeding the resistance of the space charge regions at the metal/semiconductor interface. The sensory effect consists in the chemisorption of oxygen molecules on the surface of ε-Ga 2 O 3 that according to SEM has a grain structure. As a result, the energy barrier at the grain boundaries of ε-Ga 2 O 3 increases leading to a decrease in the current. The studied structures showed high sensitivity to relatively low concentrations (0.745 %) of H 2 and CO at the T = 180-220 °C and practically did not react to the effects of NO 2 and CH 4 . This research was financially supported by the Russian Scientific Foundation, grant No 20-79-10043. [1] A V Almaev, V I Nikolaev, S I Stepanov, A I Pechnikov, A V Chikiryaka, N N Yakovlev, V M Kalygina, V V Kopyev and E V Chernikov. J. Phys. D: Appl. Phys. 53 (2020) 414004 (9pp) https://doi.org/10.1088/1361-6463/ab9c69 Figure 1
    Type of Medium: Online Resource
    ISSN: 2151-2043
    Language: Unknown
    Publisher: The Electrochemical Society
    Publication Date: 2021
    detail.hit.zdb_id: 2438749-6
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  • 4
    In: Journal of Applied Physics, AIP Publishing, Vol. 132, No. 3 ( 2022-07-21)
    Abstract: Films of α-Ga2O3 grown by Halide Vapor Phase Epitaxy (HVPE) were irradiated with protons at energies of 330, 400, and 460 keV with fluences 6 × 1015 cm−2 and with 7 MeV C4+ ions with a fluence of 1.3 × 1013 cm−2 and characterized by a suite of measurements, including Photoinduced Transient Current Spectroscopy (PICTS), Thermally Stimulated Current (TSC), Microcathodoluminescence (MCL), Capacitance–frequency (C–f), photocapacitance and Admittance Spectroscopy (AS), as well as by Positron Annihilation Spectroscopy (PAS). Proton irradiation creates a conducting layer near the peak of the ion distribution and vacancy defects distribution and introduces deep traps at Ec-0.25, 0.8, and 1.4 eV associated with Ga interstitials, gallium–oxygen divacancies VGa–VO, and oxygen vacancies VO. Similar defects were observed in C implanted samples. The PAS results can also be interpreted by assuming that the observed changes are due to the introduction of VGa and VGa–VO.
    Type of Medium: Online Resource
    ISSN: 0021-8979 , 1089-7550
    Language: English
    Publisher: AIP Publishing
    Publication Date: 2022
    detail.hit.zdb_id: 220641-9
    detail.hit.zdb_id: 3112-4
    detail.hit.zdb_id: 1476463-5
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  • 5
    In: Nanomaterials, MDPI AG, Vol. 13, No. 7 ( 2023-03-29), p. 1214-
    Abstract: In this study, the structural and electrical properties of orthorhombic κ-Ga2O3 films prepared using Halide Vapor Phase Epitaxy (HVPE) on AlN/Si and GaN/sapphire templates were studied. For κ-Ga2O3/AlN/Si structures, the formation of two-dimensional hole layers in the Ga2O3 was studied and, based on theoretical calculations, was explained by the impact of the difference in the spontaneous polarizations of κ-Ga2O3 and AlN. Structural studies indicated that in the thickest κ-Ga2O3/GaN/sapphire layer used, the formation of rotational nanodomains was suppressed. For thick (23 μm and 86 μm) κ-Ga2O3 films grown on GaN/sapphire, the good rectifying characteristics of Ni Schottky diodes were observed. In addition, deep trap spectra and electron beam-induced current measurements were performed for the first time in this polytype. These experiments show that the uppermost 2 µm layer of the grown films contains a high density of rather deep electron traps near Ec − 0.3 eV and Ec − 0.7 eV, whose presence results in the relatively high series resistance of the structures. The diffusion length of the excess charge carriers was measured for the first time in κ-Ga2O3. The film with the greatest thickness of 86 μm was irradiated with protons and the carrier removal rate was about 10 cm−1, which is considerably lower than that for β-Ga2O3.
    Type of Medium: Online Resource
    ISSN: 2079-4991
    Language: English
    Publisher: MDPI AG
    Publication Date: 2023
    detail.hit.zdb_id: 2662255-5
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