In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 37, No. 10R ( 1998-10-01), p. 5730-
Abstract:
Discharge plasmas of C 4 F 8 /Ar and C 4 F 8 /O 2 mixtures were investigated at a frequency of 13.56 MHz and a power of 34 W and at a pressure of 50 mTorr. Discharge-sustaining voltages vary almost monotonically with the gas mixing ratio. The major positive ions in C 4 F 8 /Ar discharge are C 2 F 4 + , CF 3 + and Ar + . The ion count ratio of CF + is the most intense among the positive ions in the CF system at a large Ar mixing ratio. From the variations of the ion count ratio of CF x + ( x =0–3), these ions seem to be produced partly by the electron-impact ionization of radicals generated from fluorocarbon films. In C 4 F 8 /O 2 discharge, the major positive ions are C 2 F 4 + , CF 3 + , CO + and O 2 + . The intensity ratios of ionic species vary as a function of gas mixing ratio. The ion count ratio of CO + , COF + and COF 2 + reach a maximum at an O 2 mixing ratio of about 50%, and the ion count ratio of CO + is much higher than that of O 2 + . This seems to suggest some secondary collision processes that occur in the discharge plasma.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.37.5730
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1998
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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