In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 32, No. 9S ( 1993-09-01), p. 4175-
Abstract:
The crystal structure of PbTiO 3 film, which was prepared on a Pt/SiO 2 /Si substrate by metal organic chemical vapor deposition, was investigated along with its dielectric properties. The relative dielectric constant increased with increasing film thickness. Crystal structure difference was observed below 0.3 µm of film thickness, as compared to that above 0.3 µm of thickness; i.e., the lattice constant ratio of the c -axis to a -axis, the intensity ratio of (00 l ) to ( h 00) reflections and the average crystallite size decreased, and the nonuniform stress increased with decrease in the film thickness. These crystal imperfections for below 0.3 µm thickness might be related to the existence of a low relative dielectric constant layer near the substrate.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.32.4175
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1993
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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