In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 36, No. 4B ( 1997-04-01), p. L504-
Abstract:
A new approach was used for the synthesis of diamond by the Chemical Vapor Deposition (CVD) method. The method consists of generating DC plasma between the anode substrate and the electrolyte surface under reduced pressure. With use of a water-ethylene glycol solution mixed with potassium acetate, well-faceted diamond was deposited locally on tungsten and copper substrates. Evaporation loss of the 80 mol% ethylene glycol solution was 210 m l during deposition for 2 h.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.36.L504
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1997
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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