In:
Scientific Reports, Springer Science and Business Media LLC, Vol. 5, No. 1 ( 2015-10-12)
Abstract:
A fully transparent resistive memory (TRRAM) based on Hafnium oxide (HfO 2 ) with excellent transparency, resistive switching capability and environmental stability is demonstrated. The retention time measured at 85 °C is over 3 × 10 4 sec and no significant degradation is observed in 130 cycling test. Compared with ZnO TRRAM, HfO 2 TRRAM shows reliable performance under harsh conditions, such as high oxygen partial pressure, high moisture (relative humidity = 90% at 85 °C), corrosive agent exposure and proton irradiation. Moreover, HfO 2 TRRAM fabricated in cross-bar array structures manifests the feasibility of future high density memory applications. These findings not only pave the way for future TRRAM design, but also demonstrate the promising applicability of HfO 2 TRRAM for harsh environments.
Type of Medium:
Online Resource
ISSN:
2045-2322
Language:
English
Publisher:
Springer Science and Business Media LLC
Publication Date:
2015
detail.hit.zdb_id:
2615211-3
Bookmarklink