In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 38, No. 12A ( 1999-12-01), p. L1457-
Abstract:
Interactions between Ta and SiOF films were investigated. The effect of these interactions on the crystallinity of Cu and Ta films was also examined. It was found that much a rougher interface was formed at the Ta/SiOF interface than at the Ta/SiO 2 interface. This clearly resulted from a strong interaction between Ta and SiOF occurring through the defluorination of SiOF film during Ta sputter deposition. Ta oxides and fluorides were observed to form at the interface of Ta/SiOF, which resulted in the degradation of the Ta (002) texture. Furthermore, the degradation of Ta crystallinity led to the reduction of the Cu (111) texture by causing a deficiency in interfacial heteroepitaxiality.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.38.L1457
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1999
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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