In:
Japanese Journal of Applied Physics, IOP Publishing, Vol. 32, No. 7R ( 1993-07-01), p. 3131-
Abstract:
The properties of Si(111) surfaces treated in various HF solutions are characterized by photoluminescence (PL), scanning tunneling microscopy (STM) and Fourier-transform infrared spectroscopy (FTIR). STM images show that the surfaces dipped in normal HF solution are terminated by Si-H, Si-H 2 and Si-H 3 bonds with high step density, while those treated by pH-modified buffered HF are atomically flat with wide terraces terminated mostly by Si-H bonds. Multistage oxidation processes via surface defects, atomic steps, kinks or terraces are suggested by a change in the PL intensity of HF-treated Si surfaces with exposure to oxygen. The PL measurement also shows that the surface treated with pH-modified buffered HF or boiled deionized water shows much better stability against oxidation than conventional HF-treated Si surfaces, which is consistent with the surface structure observed by means of STM.
Type of Medium:
Online Resource
ISSN:
0021-4922
,
1347-4065
DOI:
10.1143/JJAP.32.3131
Language:
Unknown
Publisher:
IOP Publishing
Publication Date:
1993
detail.hit.zdb_id:
218223-3
detail.hit.zdb_id:
797294-5
detail.hit.zdb_id:
2006801-3
detail.hit.zdb_id:
797295-7
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