In:
Key Engineering Materials, Trans Tech Publications, Ltd., Vol. 602-603 ( 2014-3), p. 511-514
Abstract:
The surface polishing of Ti 3 SiC 2 disk in fluids (water, ethanol, propanol, glycol, and glycerol) is conducted on a Buehler grinder/polisher and evaluated using surface roughness. Using Buehler automatic grinder/polisher, the Ti 3 SiC 2 disks are grinded and polished in the as-mentioned lubricants by grinding disk of diamond with sizes of 45 μm to 3 μm. The surface roughnesses of Ti 3 SiC 2 disks at each stage are measured by 3D surface profiler. The results show that the lowest surface roughness (Ra) of Ti 3 SiC 2 disk obtained by mechanical polishing is 0.04 μm. The optimum polishing process of Ti 3 SiC 2 disk is as follows: using water as lubricant, at a load of 5 N, for steps 1 to 4, the Ti 3 SiC 2 and grinding disk rotates comparatively and the sizes of diamond particles on the abrasive disk are 45, 15, 9, and 3 μm, respectively. For step 5, the abrasive disk is woven cloth with no diamond particles. The duration of each step is 5 min. Using the same polishing process, the surface roughness of Ti 3 SiC 2 disk by direct hot pressing is lower than that by in situ reactive hot pressing. Using the same polishing process but different lubricants, the surface roughness of the Ti 3 SiC 2 disks increases in the order of water, ethanol, propanol, glycol, and glycerol. In water, the surface roughness of Ti 3 SiC 2 disk decreases with the increasing quantity of water and polishing duration.
Type of Medium:
Online Resource
ISSN:
1662-9795
DOI:
10.4028/www.scientific.net/KEM.602-603
DOI:
10.4028/www.scientific.net/KEM.602-603.511
Language:
Unknown
Publisher:
Trans Tech Publications, Ltd.
Publication Date:
2014
detail.hit.zdb_id:
2073306-9
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