Format:
Online-Ressource
ISSN:
1616-3028
Content:
Abstract: A fundamental approach to fabricating a nonstick replica mold with high performance for the manufacturing of high‐resolution nanostructures using mold‐based lithography is presented. Low‐viscosity liquid blends consisting of methacrylate multi‐functionalized silsesquioxane (SSQMA), difunctional acrylics, and a small amount of silicone diacrylate (Si‐DA) with low surface tension were used as nonstick replica‐mold materials. The cured SSQMA/acrylic/Si‐DA networks showed a high resistance to organic solvents (〈1.2 wt.%), high UV transparency (〉90% at 365 nm), hydrophobicity (water contact angle 〉90°), high modulus and wide‐range modulus tunability (0.6–4.42 GPa) and small shrinkage (〈3% in height). The mold materials with a nonstick property conferred by Si‐DA possessed the ability to form sub‐25‐nm features with a high line‐to‐space ratio (1:1) and a high aspect ratio (4:1). In addition, a sufficiently cured replica mold with a low concentration of residual, uncross‐linked (meth) acrylates was able to successfully replicate sub‐25‐nm features with a high line‐to‐space ratio (1:1) and a high aspect ratio (4:1), even if the release agent was not modified. Furthermore, replica molds can potentially be used to fabricate patterns free of bubble defects because of sufficient gas permeability.
In:
volume:21
In:
number:19
In:
year:2011
In:
pages:3681-3689
In:
extent:9
In:
Advanced functional materials, Weinheim : Wiley-VCH, [2001]-, 21, Heft 19 (2011), 3681-3689 (gesamt 9), 1616-3028
Language:
English
DOI:
10.1002/adfm.201101278
URN:
urn:nbn:de:101:1-2023040405090754432971
URL:
https://doi.org/10.1002/adfm.201101278
URL:
https://nbn-resolving.org/urn:nbn:de:101:1-2023040405090754432971
URL:
https://d-nb.info/1285260279/34
URL:
https://doi.org/10.1002/adfm.201101278
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