Format:
Online Ressource (xiii, 294 p.)
,
ill.
Edition:
Online-Ausg.
ISBN:
9781615832392
,
1615832394
,
9781860943164
,
1860943160
,
9781860949623
,
1860949622
Content:
1. Introduction2. Experimental Apparatus; 3. Particle Synthesis; 3.1. Thermal Plasma Synthesis; 3.2. Particle Synthesis with a Thermal Plasma Expanded Through a Subsonic Nozzle; 4. Rationale for Operating in the Hypersonic Flow Regime; 5. Particle Synthesis with a Supersonically Expanded Plasma; 6. Film Deposition; 6.1. Apparatus and Operating Conditions; 6.2. Numerical Modelling of Flow and Particle Trajectories; 6.3. Experimental Results; 7. Film Post-Treatment; 8. Focused Nanoparticle Beam Deposition of Patterned Microstructures; 9. Summary and Conclusions; Acknowledgments; References.
Content:
3. Experimental Study of Directed Vapour Deposition3.1. Gas Flow Fundamentals; 3.2. Visualizing the Carrier Gas Flow; 3.3. Visualising the Interaction between Carrier Gas and Vapour Flows; 3.4. Deposition Efficiency at Constant e-beam Power; 3.5. Deposition Efficiency Under Constant Gas Flow Conditions; 4. Model-Based Study of Directed Vapour Deposition -- 4.1. Model Description; 4.2. Simulation of DVD Conditions; 5. Application of DVD to the Creation of Thermal Barrier Coatings; 6. Enhancing Directed Vapour Deposition
Content:
7. Initial Results from a Second Generation of ""Directed Vapour Deposition""8. Conclusions; Acknowledgments; References; Index.
Content:
Chapter 7 Aerosol-Based Flame Synthesis: A Microreactor for Silica Nanoparticles1. Introduction; 2. Experimental; 3. Results and Discussion; 3.1. Jet Mixing; 3.2. Flame Characterization; 3.3. Nanoparticle Synthesis; 4. Conclusions; Acknowledgments; References; Chapter 9 Deposition of Electron Beam Evaporant in a Low Vacuum Gas Flow Environment; 1. Motivating Development of a New Vapor Deposition Technology; 2. Depositing Electron Beam Evaporant from a Gas Flow; 2.1. Vapor Creation Using an Electron Beam; 2.2. Vapor Transport in a Flowing Gas Stream; 2.3. Directed Vapour Deposition.
Content:
Preface; List of Contributors; CONTENTS; Chapter 1 Review of Advances in Processing Methods: Films and Nanocrystalline Powders; Chapter 3 Application of Pulsed Injection MOCVD to the Deposition of Oxide Single Layers and Superlattices; 1. Introduction; 2. Deposition of Oxide Films from the Metal-Organic Vapour Phase; 3. Experimental Set-up and Characterisation; 4. Results; 4.1. Oxide Films Grown by Pulsed Injection CVD; 4.2. Oxide Multilayered Structures Deposited by Pulsed Injection CVD; 5. Conclusions; References; Chapter 6 Hypersonic Plasma Particle Deposition of Nanocrystalline Coatings.
Content:
The use of advanced engineering ceramic films and powders for structural and functional applications is expanding rapidly. Improved materials and innovative methods of fabrication are needed to enhance the engineering performance and reduce the production costs. This book highlights innovative/cost-effective material-processing methods, at a mature production stage and also in development. In addition, issues and strategies associated with scaling-up are emphasized
Note:
In: Knovel library. - Dateiformat Volltext: PDF. - Based on an international conference on "Innovative/Cost-effective Materials Processing Methods", Imperial College, London, 6-7 July, 2000. - Includes bibliographical references and index. - Description based on print version record
Additional Edition:
9781860943164
Additional Edition:
1860943160
Additional Edition:
1281869414
Additional Edition:
9781281869418
Additional Edition:
9786611869410
Additional Edition:
6611869417
Additional Edition:
1860943160
Additional Edition:
Erscheint auch als Druck-Ausgabe Innovative processing of films and nanocrystalline powders London : Imperial College Press, ©2002
Language:
English
Keywords:
Electronic books
;
Electronic books
;
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