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  • 1
    UID:
    almahu_9949198765402882
    Umfang: XV, 633 p. , online resource.
    Ausgabe: 1st ed. 1993.
    ISBN: 9789401117272
    Serie: Nato Science Series E:, Applied Sciences ; 234
    Inhalt: The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
    Anmerkung: Plasma Sputter Deposition Systems: Plasma Generation, Basic Physics and Characterization -- Technology and Application of Filamentless RF - Ion Sources in Ion Beam Sputter Deposition -- Physics of Film Growth from the Vapor Phase -- Techniques for the Growth of Crystalline Films by Molecular Beam Deposition -- Discharge Density Increase for High Rate Magnetron Sputtering -- On the Transport of Sputtered Species in Plasma Sputter-Deposition Systems -- Influence of Sputter Gas Pressure and Substrate Bias on Intrinsic Stress and Crystallinity of Coatings Produced by Magnetron Sputtering -- Sputter Deposition of Multicomponent Targets: What Parts of the Process Affect the Elemental Composition of the Film -- A Proposition of a Novel Reactive Sputter-Deposition System for Synthesizing Multi-Component Materials -- The Influence of Precursors on the Preparation of Thin Pyrite Films by Metal Organic Chemical Vapor Deposition -- Modelling of the Intrinsic Stress in PVD-Coatings -- Physical Vapor Deposition of Multicomponent Oxide Thin Films: Techniques, Basic Deposition Processes and Film Processing-Microstructure-Property Relationships -- Pulsed Laser Deposited Metal-Oxide Based Superconductor, Semiconductor and Dielectric Heterostructures and Superlattices -- Synthesis of Optical Thin Films: Fundamentals and Applications -- Ion Beam-Based Characterization of Multicomponent Oxide Thin Films and Thin Film Layered Structures -- Electron Spectroscopic Analysis of Multicomponent Thin Films with Particular Emphasis on Oxides -- Transmission Electron Microscopy of Oxide Thin Films -- Laser Deposition of HTSC Films: Expansion of the Laser Plasma, Deposition of Particles, Formation of the Crystal Structure and Superconducting Properties of Films -- YBACUO Films by Pulsed Laser Deposition and Sputtering -- Transverse Electrooptic Properties of Magnetron Sputtered PLZT Thin Films -- Lead Zirconate Titanate Ferroelectric Thin Films by Laser Ablation Deposition -- Photo Voltaic Properties of Reactive Thermal Evaporated Indium Oxide (IO)/ Silicon Junctions -- In Situ Compositional Analysis of Multielement Thin Films -- Si-Ge Strained Layer Heterostructures: Device Possibilities and Process Limitations -- Growth, Properties and Applications of Epitaxial Selicides -- Deposition Fundamentals and Properties of Metallic and Diffusion Barrier Films -- Epitaxial CoSi2 Formation on (001) Si using Sequentially Deposited Ti-Co Bilayers -- Stress in Si1-xGex Films Prepared by Ion Beam Sputtering -- Band Engineering of High Bandgap Semiconductors by Superlattices -- Characterization of Tungsten Films and Hard Tungsten-Carbon Coatings Prepared by DC Magnetron Sputtering Process -- Pulsed Excimer Laser Induced Reactions at the Tungsten-Silicon Interface -- Rapid Pulsed CO2 - Laser Annealing of Silicon-Nitride / Silicon Interface States -- Interface Properties of Anodic Sulfide and Sulfide-Oxide Films on n-InSb -- Spin Glass Like Behavior in Cr-Cu Multilayers -- High Temperature Superconducting Thin Film-Based Devices -- Ferroelectric Thin Films and Device Applications -- Phase Locking in Series-Connected Nb-Al-Nb Planar Josephson Weak Links.
    In: Springer Nature eBook
    Weitere Ausg.: Printed edition: ISBN 9789401047579
    Weitere Ausg.: Printed edition: ISBN 9780792322658
    Weitere Ausg.: Printed edition: ISBN 9789401117289
    Sprache: Englisch
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
  • 2
    UID:
    almahu_9949198671702882
    Umfang: XIV, 558 p. , online resource.
    Ausgabe: 1st ed. 1990.
    ISBN: 9789400919464
    Serie: Nato Science Series E:, Applied Sciences ; 176
    Inhalt: An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
    Anmerkung: Basic Physics of Plasmas/Discharges: Production of Active Species -- Plasma Chemistry in Etching -- Optical Diagnostic Techniques for Low Pressure Plasma Processing -- Measuring Eedf in Gas Discharge Plasmas -- Transport Phenomena in Plasma Processing -- Kinetics of a Low-Pressure H2 Multipole Discharge Used for GaAs Treatment -- Ar and Ti Excited States in the Vicinity of the Substrate during Magnetron Sputtering of Ti -- Modeling of the Plasma Nitriding Process -- Plasma Measurements in a Magnetron Sputtering Device -- Laser Induced Fluorescence Measurements of Ion Distribution Functions -- Laser Induced Fluorescence Measurements in Plasma Etching Processes -- Effect of Modulation on the Plasma Deposition of Hydrogenated and Fluorinated Silicon Nitride -- Partial Pressure Analysis of CF4/O2 Plasmas -- Surface Characterization of Corona Discharge Treated Poly (Ethylene Terephthalate) -- The Physics of the Sputter Erosion Process -- Basic Phenomena in Reactive Etching of Materials -- Particle Bombardment Effects in thin Film Deposition -- Low-Energy Ion/Surface Interactions during Film Growth from the Vapor Phase: Effects on Nucleation and Growth Kinetics, Defect Structure, and Elemental Incorporation Probabilities -- Low-Energy Accelerated-Ion Doping of Si During Molecular Beam Epitaxy: Incorporation Probabilities, Depth Distribution, and Electrical Properties -- In Situ Substrate Chemical Analysis during Sputter Deposition -- Reactive Ion Beam Etching Studies of Tungsten with CF4 Using Ion Scattering Spectroscopy -- Estimation of Structural Damage Induced by Technological Processes on the Surface of Crystalline Binary Compounds by X-Ray Photoelectron Diffraction: Application to Reactive Ion Etching of GaAs(001) Surfaces -- In-Situ XPS Studies of thin Silicon Nitride Films on III-V Semiconductors Produced by Remote Plasma Enhanced Chemical Vapour Deposition -- Compositional and Structural Analysis of RF Sputtered Hydrogenated Amorphous Si1-xGex Alloys -- Thin Film Inhomogeneity Characterization by Ion Beam Technique -- Theoretical Analysis of the Influence of Foil Inhomogeneities on the Angular Variation of the Energy-Loss -- Applications of Plasma Etching -- The Application of Plasmas to thin Film Depostion Processes -- Plasma-Enhanced CVD of Silicon-Related Compounds -- Plasma-Assisted Deposition of Polymers -- RBS, SIMS, AES and ESCA Analysis of Surfaces -- The Process Transfer of Oxygen Reactive Ion Etching of Polymide between Different Etch Equipments -- Reactive Ion Etching of Silicon Containing Resists -- Surface Treatment of PP Films by a Non Equilibrium Low Pressure Plasma of NH3, N2, Ar -- Ion Beam and Plasma-Induced Etching in Structuring Electronic Devices -- Plasma Induced Polymerization -- Technological Considerations on thin Films Process Based on NTa2 -- Surface Modification of Biomaterials with Plasma Glow Discharge Processes -- Rutherford Backscattering and Nuclear Reaction Analysis Study of Plasma Oxidation Silicides -- Recent Magnetron Design at Minho University - Characterization -- A Novel Microwave Ion Source as a New Tool for Submicron Etching of Microelectronic Devices -- Laser Coating of Engineering Materials for Increased Wear Resistance -- A Two-Stand Laboratory Facility for the Study of Laser Supported Plasma-Surface Interaction -- Effects of a Partial Orientation of Cu++ Complexes in YBa2Cu3O7-x Pellets.
    In: Springer Nature eBook
    Weitere Ausg.: Printed edition: ISBN 9789401073691
    Weitere Ausg.: Printed edition: ISBN 9780792305842
    Weitere Ausg.: Printed edition: ISBN 9789400919471
    Sprache: Englisch
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
    BibTip Andere fanden auch interessant ...
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