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  • 1
    Online Resource
    Online Resource
    New York, NY : Springer Science+Business Media, LLC
    UID:
    b3kat_BV036650318
    Format: 1 Online-Ressource , v.: digital
    Edition: Online_Ausgabe New York, NY Springer Science+Business Media, LLC 2007 Springer ebook collection / Chemistry and Materials Science 2005-2008 Sonstige Standardnummer des Gesamttitels: 041171-1
    ISBN: 9780387252964 , 9780387497624
    Additional Edition: Reproduktion von Science of Microscopy 2007
    Language: English
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  • 2
    Book
    Book
    Orlando u.a. :Academic Pr.,
    UID:
    almahu_BV002184187
    Format: XIX, 633 S. : Ill., graph. Darst.
    ISBN: 0-12-014578-2
    Series Statement: Advances in electronics and electron physics / Supplement 16
    Language: English
    Subjects: Physics
    RVK:
    RVK:
    Keywords: Elektronenmikroskopie ; Geschichte
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  • 3
    Online Resource
    Online Resource
    Cham :Springer,
    UID:
    almahu_BV046283100
    Format: 1 Online-Ressource (XXXII, 1543 Seiten) : , Illustrationen, Diagramme (überwiegend farbig).
    ISBN: 978-3-030-00069-1
    Series Statement: Springer handbooks
    Additional Edition: Erscheint auch als Druck-Ausgabe ISBN 978-3-030-00068-4
    Language: English
    Keywords: Mikroskopie
    URL: Volltext  (URL des Erstveröffentlichers)
    URL: Volltext  (URL des Erstveröffentlichers)
    Author information: Spence, John C. H.
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  • 4
    Book
    Book
    Berlin [u.a.] :Springer,
    UID:
    almafu_BV000062891
    Format: XI, 462 S. : , Ill., graph. Darst.
    ISBN: 3-540-10296-5 , 0-387-10296-5
    Series Statement: Topics in current physics 18
    Additional Edition: Erscheint auch als Online-Ausgabe ISBN 978-3-642-81516-4
    Language: English
    Subjects: Physics
    RVK:
    RVK:
    Keywords: Magnetische Linse ; Elektronenlinse ; Aufsatzsammlung ; Aufsatzsammlung ; Aufsatzsammlung
    URL: Cover
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  • 5
    Book
    Book
    New York :Acad. Press,
    UID:
    almafu_BV002002195
    Format: VIII, 379 S. : , graph. Darst.
    Series Statement: Advances in electronics and electron physics : Supplement 7
    Language: English
    Subjects: Physics
    RVK:
    Keywords: Elektronenlinse ; Elektronenlinse ; Quadrupol
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  • 6
    Online Resource
    Online Resource
    London, England :Academic Press is an imprint of Elsevier,
    UID:
    almahu_9949232510602882
    Format: 1 online resource (767 pages)
    Edition: Second edition.
    ISBN: 0-12-813405-4 , 0-12-813369-4
    Note: Front Cover -- Principles of Electron Optics -- Copyright Page -- Contents -- Preface to the Second Edition -- Preface to the First Edition (Extracts) -- Acknowledgments -- VII. Instrumental Optics -- 35 Electrostatic Lenses -- 35.1 Introduction -- 35.2 Immersion Lenses -- 35.2.1 The Single Aperture -- 35.2.2 The Two-Electrode Lens -- 35.2.2.1 Adjacent cylinders -- 35.2.2.2 Cylinders separated by a small gap -- 35.2.2.3 Two cylinders separated by an arbitrary distance -- 35.2.2.4 Cylinders of different radius -- 35.2.2.5 A unified representation -- 35.2.3 Three or More Electrodes -- 35.2.3.1 Zoom lenses -- 35.2.3.2 Accelerators -- 35.2.3.3 Other studies -- 35.3 Einzel Lenses -- 35.3.1 The Principal Potential Models -- 35.3.1.1 Regenstreif's model -- 35.3.1.2 Schiske's model -- 35.3.1.3 The model of Kanaya and Baba -- 35.3.1.4 The theory of Wendt -- 35.3.1.5 Shimoyama's contribution -- 35.3.1.6 Crewe's model -- 35.3.1.7 Ura's unified representation -- 35.3.2 Measurements and Exact Calculations -- 35.3.3 Miniature Lenses -- 35.4 Grid or Foil Lenses -- 35.5 Conical Lenses and Coaxial Lenses -- 35.6 Cylindrical Lenses -- 36 Magnetic Lenses -- 36.1 Introduction -- 36.1.1 Modes of Operation -- 36.1.2 Practical Design -- 36.1.3 Notation -- 36.2 Field Models -- 36.2.1 Symmetric Lenses: Glaser's Bell-Shaped Model -- 36.2.1.1 Paraxial properties -- 36.2.1.2 Aberrations -- 36.3 Related Bell-Shaped Curves -- 36.3.1 The Grivet-Lenz Model -- 36.3.2 The Exponential Model -- 36.3.3 The Power Law Model -- 36.3.4 The Convolutional Models -- 36.3.5 A Generalized Model -- 36.3.6 Unsymmetric Lenses -- 36.3.7 Hahn's Procedure -- 36.3.8 Other Models -- 36.4 Measurements and Universal Curves -- 36.4.1 Introduction -- 36.4.2 Unsaturated Lenses -- 36.4.3 Saturated Lenses -- 36.5 Ultimate Lens Performance -- 36.5.1 Tretner's Analysis. , 36.5.1.1 Chromatic aberration, electrostatic case -- 36.5.1.2 Spherical aberration, electrostatic case -- 36.5.1.3 Spherical aberration, magnetic case, L1 -- 36.5.1.4 Spherical aberration, magnetic case, L2 -- 36.5.1.5 Chromatic aberration, magnetic case L1 -- 36.5.1.6 Chromatic aberration, magnetic case L2 -- 36.5.2 Earlier Studies -- 36.5.3 Optimization -- 36.6 Lenses of Unusual Geometry -- 36.6.1 Mini-Lenses, Pancake Lenses and Single-Polepiece Lenses -- 36.6.2 Laminated Lenses -- 36.7 Special Purpose Lenses -- 36.7.1 Unsymmetrical Round Lenses -- 36.7.2 Superconducting Shielding Lenses or Cryolenses -- 36.7.3 Permanent-Magnet Lenses -- 36.7.4 Triple-Polepiece Projector Lenses -- 36.7.5 Objective Lens With Low Magnetic Field at the Specimen Capable of Good Resolution -- 36.7.6 Probe-Forming Lenses for Low-Voltage Scanning Electron Microscopes -- 36.7.7 Hybrid TEM-STEM Operation: the Twin and Super-Twin Geometries -- 36.7.8 The Lotus-Root Multibeam Lens -- 37 Electron Mirrors, Low-Energy-Electron Microscopes and Photoemission Electron Microscopes, Cathode Lenses and Field-Emiss... -- 37.1 The Electron Mirror Microscope -- 37.2 Mirrors in Energy Analysis -- 37.3 Cathode Lenses, Low-Energy-Electron Microscopes and Photoemission Electron Microscopes -- 37.4 Field-Emission Microscopy -- 37.5 Ultrafast Electron Microscopy -- 38 The Wien Filter -- 39 Quadrupole Lenses -- 39.1 Introduction -- 39.2 The Rectangular and Bell-Shaped Models -- 39.3 Isolated Quadrupoles and Doublets -- 39.4 Triplets -- 39.5 Quadruplets -- 39.6 Other Quadrupole Geometries -- 39.6.1 Arc Lenses -- 39.6.2 Crossed Lenses -- 39.6.3 Biplanar Lenses -- 39.6.4 Astigmatic Tube Lenses -- 39.6.5 Transaxial Lenses -- 39.6.6 Radial Lenses -- 40 Deflection Systems -- 40.1 Introduction -- 40.2 Field Models for Magnetic Deflection Systems -- 40.2.1 Field of a Closed Loop in Free Space. , 40.2.2 Approximate Treatment of Ferrite Shields -- 40.2.3 The Axial Harmonics -- 40.3 The Variable-Axis Lens -- 40.3.1 Theoretical Considerations -- 40.3.2 Practical Design -- 40.4 Alternative Concepts -- 40.5 Deflection Modes and Beam-Shaping Techniques -- VIII. Aberration Correction and Beam Intensity Distribution (Caustics) -- 41 Aberration Correction -- 41.1 Introduction -- 41.2 Multipole Correctors -- 41.2.1 Quadrupoles and Octopoles -- 41.2.2 Sextupole Optics and Sextupole Correctors -- 41.2.3 Practical Designs -- 41.2.4 Measurement of Aberrations -- 41.3 Foil Lenses and Space Charge -- 41.3.1 Space Charge Clouds -- 41.3.2 Foil Lenses -- 41.4 Axial Conductors -- 41.5 Mirrors -- 41.6 High-Frequency Lenses -- 41.6.1 Spherical Correction -- 41.6.2 Chromatic Correction -- 41.7 Other Aspects of Aberration Correction -- 41.8 Concluding Remarks -- 42 Caustics and Their Uses -- 42.1 Introduction -- 42.2 The Concept of the Caustic -- 42.3 The Caustic of a Round Lens -- 42.4 The Caustic of an Astigmatic Lens -- 42.5 Intensity Considerations -- 42.6 Higher Order Focusing Properties -- 42.7 Applications of Annular Systems -- IX. Electron Guns -- 43 General Features of Electron Guns -- 43.1 Thermionic Electron Guns -- 43.2 Schottky Emission Guns -- 43.3 Cold Field Electron Emission Guns -- 43.4 Beam Transport Systems -- 44 Theory of Electron Emission -- 44.1 General Relations -- 44.2 Transmission Through a Plane Barrier -- 44.3 Thermionic Electron Emission -- 44.4 The Tunnel Effect -- 44.5 Field Electron Emission -- 44.6 Schottky Emission -- 44.7 Concluding Remarks -- 45 Pointed Cathodes Without Space Charge -- 45.1 The Spherical Cathode -- 45.2 The Diode Approximation -- 45.3 Field Calculation in Electron Sources with Pointed Cathodes -- 45.3.1 Analytic Field Models -- 45.3.2 Rigorous Methods -- 45.4 Simple Models -- 45.4.1 A Diode-Field Model. , 45.4.2 Thermionic Triode Guns -- 46 Space Charge Effects -- 46.1 The Spherical Diode -- 46.2 Asymptotic Properties and Generalizations -- 46.3 Determination of the Space Charge -- 46.4 The Boersch Effect -- 46.4.1 Introduction -- 46.4.2 The Shift of the Mean Energy -- 46.4.3 Thermodynamic Considerations -- 46.4.3.1 Transverse temperatures -- 46.4.3.2 The longitudinal temperature -- 46.4.3.3 The thermodynamic limit -- 46.4.3.4 The beam entropy -- 46.4.4 Analytical Calculations -- 47 Brightness -- 47.1 Application of Liouville's Theorem -- 47.2 The Maximum Brightness -- 47.3 The Influence of Apertures -- 47.4 Lenz's Brightness Theory -- 47.4.1 Rotationally Symmetric Electrostatic Fields -- 47.4.2 The Generalized Theory -- 47.5 Measurement of the Brightness -- 47.6 Coulomb Interactions and Brightness -- 47.7 Aberrations in the Theory of Brightness -- 48 Emittance -- 48.1 Trace Space and Hyperemittance -- 48.2 Two-Dimensional Emittances -- 48.2.1 General Emittance Ellipses -- 48.2.2 Acceptance and Matching -- 48.3 Brightness and Emittance -- 48.4 Emittance Diagrams -- 49 Gun Optics -- 49.1 The Fujita-Shimoyama Theory -- 49.2 Rose's Theory -- 49.3 Matching the Paraxial Approximation to a Cathode Surface -- 50 Complete Electron Guns -- 50.1 Justification of the Point Source Model -- 50.2 The Lens System in Field-Emission Devices -- 50.3 Hybrid Emission -- 50.4 Conventional Thermionic Guns -- 50.5 Pierce Guns -- 50.6 Multi-electron-beam Systems -- 50.7 Carbon Nanotube Emitters -- 50.8 Further Reading -- X. Systems with a Curved Optic Axis -- 51 General Curvilinear Systems -- 51.1 Introduction of a Curvilinear Coordinate System -- 51.2 Series Expansion of the Potentials and Fields -- 51.3 Variational Principle and Trajectory Equations -- 51.4 Simplifying Symmetries -- 51.5 Trajectory Equations for Symmetric Configurations -- 51.6 Aberration Theory. , 51.6.1 Magnetic Systems -- 51.6.2 Compound Systems -- 51.6.2.1 Aberrations of second rank -- 51.6.2.2 Third-rank aberrations -- 52 Sector Fields and Their Applications -- 52.1 Introduction -- 52.2 Magnetic Devices with a Circular Optic Axis -- 52.3 Radial (Horizontal) Focusing for a Particular Model Field -- 52.4 The Linear Dispersion -- 52.5 The Axial (Vertical) Focusing -- 52.6 Fringing Field Effects -- 52.7 Aberration Theory: The Homogeneous Magnetic Field (n=0) -- 52.8 Optimization Procedures -- 52.8.1 Single Deflection Prisms -- 52.8.2 Use of Symmetries -- 52.9 Energy Analysers and Monochromators -- 52.9.1 Introduction -- 52.9.2 In-column Energy Analysers -- 52.9.3 Details of the Various Filters -- 52.9.4 The Möllenstedt and Ichinokawa Analysers -- 52.9.5 Postcolumn Spectrometers -- 52.9.6 Monochromators -- 53 Unified Theories of Ion Optical Systems -- 53.1 Introduction -- 53.2 Electrostatic Prisms -- 53.3 A Unified Version of the Theory -- 53.4 The Literature of Ion Optics -- Notes and References -- Part VII, Chapter 35 -- Part VII, Chapter 36 -- Part VII, Chapters 37-40 -- Part VIII, Chapters 41 and 42 -- Part IX, Chapters 43-50 -- Part X, Chapters 51-53 -- Conference Proceedings -- Index -- Back Cover.
    Additional Edition: Print version: ISBN 9780128133699
    Language: English
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  • 7
    UID:
    b3kat_BV009931581
    Format: XII S., S. 1192 - 1899, XXIV S. , graph. Darst.
    ISBN: 0123333547
    In: 3
    Language: English
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  • 8
    UID:
    b3kat_BV001773886
    Format: X S., S. 630 - 1188, XVIII S. , graph. Darst.
    ISBN: 0123333520
    In: 2
    Language: English
    Subjects: Physics
    RVK:
    Keywords: Elektronenoptik
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  • 9
    UID:
    b3kat_BV002500755
    Format: XII, 623, XVIII S. , graph. Darst.
    ISBN: 0123333512
    In: 1
    Language: English
    Subjects: Physics
    RVK:
    Keywords: Elektronenoptik
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  • 10
    Book
    Book
    Berlin [u.a.] :Springer,
    UID:
    almafu_BV002261895
    Format: XIV, 296 S. : , Ill., graph. Darst.
    ISBN: 3-540-09622-1 , 0-387-09622-1
    Series Statement: Topics in current physics 13
    Note: Literaturang.
    Additional Edition: Erscheint auch als Online-Ausgabe ISBN 978-3-642-81381-8
    Language: English
    Subjects: Physics
    RVK:
    RVK:
    RVK:
    Keywords: Elektronenmikroskopie ; Bildanalyse ; Elektronenmikroskopie ; Bildverarbeitung ; Elektronenmikroskop ; Bildverarbeitung
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