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Study of Si and C adatoms and SiC clusters on the silicon surface by the molecular dynamics method (2008)

Kharlamov, Vladimir S. ; Trushin, Yuri V. ; Zhurkin, E. E. ; [et al.]

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UID:

(DE-602)gbv_589039156

ISSN: 0038-5662

In: Technical physics, New York, NY : Pleiades Publ., 1956, 53(2008), 11, Seite 1490-1503, 0038-5662

In: volume:53

In: year:2008

In: number:11

In: pages:1490-1503

Language: English

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Study of Si and C adatoms and SiC clusters on the silicon surface by the molecular dynamics method (2008)

Kharlamov, Vladimir S. ; Trushin, Yuri V. ; Zhurkin, E. E. ; [et al.]

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UID:

(DE-627)589039083

ISSN: 1090-6525

In: Technical physics, Berlin : Springer Science + Business Media, 1997, 53(2008), 11, Seite 1490-1503, 1090-6525

In: volume:53

In: year:2008

In: number:11

In: pages:1490-1503

Language: English

URL: Volltext

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Concentration profile simulation of SiC/Si heterostructures (2016)

Pezoldt, Jörg [VerfasserIn] ; Kharlamov, Vladimir S. [VerfasserIn] ; Kulikov, Dmitri V. [VerfasserIn] ; [et al.]

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UID:

(DE-602)gbv_866888926

ISSN: 1662-9752

In: Materials science forum, Baech : Trans Tech Publications Ltd., 1984, 858(2016), Seite 501-504, 1662-9752

In: volume:858

In: year:2016

In: pages:501-504

Language: English

DOI: 10.4028/www.scientific.net/MSF.858.501

URL: Volltext

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Reconstruction of concentration profiles in heterostructures with chemically modified interfaces (2018)

Kharlamov, Vladimir S. [VerfasserIn] ; Kulikov, Dmitri V. [VerfasserIn] ; Lubov, Maxim N. [VerfasserIn] ; [et al.]

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UID:

(DE-602)gbv_1023979861

Format: 9

ISSN: 0021-8979

In: Journal of applied physics, Melville, NY : AIP, 1937, 123(2018), 21, Seite 215302, 0021-8979

In: volume:123

In: year:2018

In: number:21

In: pages:215302

In: extent:9

Language: English

DOI: 10.1063/1.5010287

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Reconstruction of concentration profiles in heterostructures with chemically modified interfaces (2018)

Kharlamov, Vladimir S. [VerfasserIn] ; Kulikov, Dmitri V. [VerfasserIn] ; Lubov, Maxim N. [VerfasserIn] ; [et al.]

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UID:

(DE-627)102397973X

Format: 9

ISSN: 1089-7550

In: Journal of applied physics, Melville, NY : American Inst. of Physics, 1931, 123(2018), 21, Artikel-ID 215302, 1089-7550

In: volume:123

In: year:2018

In: number:21

In: elocationid:215302

In: extent:9

Language: English

DOI: 10.1063/1.5010287

URL: Volltext

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The Luminescent Properties of Ion-Implantation-Fabricated SiO2:nc-Si Nanostructures Annealed at High Temperatures (2004)

Tetelbaum, David I. [Verfasser] ; Gorshkov, Oleg N. [Verfasser] ; Kasatkin, Alexandr P. [Verfasser] ; [et al.]

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UID:

(DE-101)1225550785

Format: Online-Ressource , online resource.

ISSN: 1946-4274 , 1946-4274

In: volume:777

In: number:1

In: day:1

In: month:1

In: year:2004

In: pages:561-566

In: date:12.2003

In: Materials Research Society, MRS online proceedings library, Warrendale, Pa. : MRS, 1998-, 777, Heft 1 (1.1.2004), 561-566, 12.2003, 1946-4274

Language: English

DOI: 10.1557/PROC-777-T5.6

URN: urn:nbn:de:101:1-2021012120384618659662

URL: https://doi.org/10.1557/PROC-777-T5.6

URL: https://nbn-resolving.org/urn:nbn:de:101:1-2021012120384618659662

URL: https://d-nb.info/1225550785/34

URL: https://doi.org/10.1557/PROC-777-T5.6

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High-temperature high-dose implantation of N + and Al + ions in 6H-SiC (1997)

Yankov, Rossen A. ; Voelskow, Matthias ; Kreissig, W. ; [et al.]

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UID:

(DE-627)60270541X

ISSN: 1090-6533

In: Technical physics letters, Berlin : Springer Science + Business Media, 1993, 23(1997), 8, Seite 617-620, 1090-6533

In: volume:23

In: year:1997

In: number:8

In: pages:617-620

Language: English

URL: Volltext

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Initial stages of the MBE growth of silicon carbide nanoclusters on a silicon substrate (2004)

Trushin, Yuri V. ; Zhurkin, E. E. ; Safonov, K. L. ; [et al.]

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UID:

(DE-627)48770875X

ISSN: 1090-6533

In: Technical physics letters, Berlin : Springer Science + Business Media, 1993, 30(2004), 8, Seite 641-643, 1090-6533

In: volume:30

In: year:2004

In: number:8

In: pages:641-643

Language: English

URL: Volltext

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Article

High-temperature high-dose implantation of N + and Al + ions in 6H-SiC (1997)

Yankov, Rossen A. ; Voelskow, Matthias ; Kreissig, W. ; [et al.]

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UID:

(DE-627)602705495

ISSN: 1063-7850

In: Technical physics letters, Road Town, Tortola, British Virgin Islands : Pleiades Publ., 1993, 23(1997), 8, Seite 617-620, 1063-7850

In: volume:23

In: year:1997

In: number:8

In: pages:617-620

Language: English

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Exotic Topological Magnetic States in Thin Co/Pd Ferromagnetic Films (2024)

Dorokhin, Mikhail V. [Verfasser] ; Ved, Mikhail V. [Verfasser] ; Kalentyeva, Irina L. [Verfasser] ; [et al.]

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UID:

(DE-101)1323476911

Format: Online-Ressource

ISSN: 1521-3889

Content: Abstract: Thin ferromagnet/heavy metal multilayer films are considered as prospective media for a magnetic recording and Co/Pd films are a good example of such materials. In this work, the magnetic properties and micromagnetic structure of Co/Pd multilayer films are studied with different bilayer thicknesses ([Co (0.3 × t nm)/Pd (0.5 × t nm)]10), but with the same ratio Co versus Pd. Transmission electron microscope and X‐ray diffraction studies allow authors to suppose that the investigated films are highly mixed alloys. Magnetic force microscopy and Lorentz transmission electron microscopy showed the presence of various micromagnetic features in the films. Along with skyrmions that are well‐known magnetic topological artifacts some new features are revealed, which are interpreted as 360° domain walls, skyrmioniums and the combination of the above two. It is found that the type and density of micromagnetic features strongly depend on the bilayer thickness parameter (t). The effect is associated with the peculiarities of interfacial magnetic interactions in the samples with highly mixed interfaces. The tooling coefficient represents a useful tool of the electron beam evaporation technique enabling wide manipulation of micromagnetic particles, in particular, skyrmioniums that are currently considered a prospective media for current driven magnetic recording.

In: day:13

In: month:03

In: year:2024

In: extent:11

In: Annalen der Physik, Berlin : Wiley-VCH, 1799-, (13.03.2024) (gesamt 11), 1521-3889

Language: English

DOI: 10.1002/andp.202300480

URN: urn:nbn:de:101:1-2024031413215042274918

URL: https://doi.org/10.1002/andp.202300480

URL: https://nbn-resolving.org/urn:nbn:de:101:1-2024031413215042274918

URL: https://d-nb.info/1323476911/34

URL: https://doi.org/10.1002/andp.202300480

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