In:
Open Physics, Walter de Gruyter GmbH, Vol. 9, No. 2 ( 2011-4-1), p. 404-409
Abstract:
The lithography is a basic microelectronic process which determines properties of fabricated device. The resolution of optical lithography applied nowadays is insufficient for creating high resolution patterns such as gate electrode in transistors. The scaling ability is the major motivation for undertaking experiments to elaborate high resolution lithography techniques. The atomic force microscope (AFM) is commonly used as tool for creation patterns in sub-micrometers resolution. In this paper, the results of simulations of electromagnetic field behavior during passing the gap with a size smaller than the wavelength of the optical lithography light source are presented. Also results of the nanoscratching lithography prepared for various parameters of force that are applied to the tip are summarized.
Type of Medium:
Online Resource
ISSN:
2391-5471
DOI:
10.2478/s11534-010-0115-8
Language:
English
Publisher:
Walter de Gruyter GmbH
Publication Date:
2011
detail.hit.zdb_id:
2814058-8
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