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  • 1
    UID:
    b3kat_BV044531050
    Format: 1 Online-Ressource (X, 315 p. 110 illus)
    ISBN: 9783319569796
    Additional Edition: Erscheint auch als Druck-Ausgabe ISBN 978-3-319-56978-9
    Language: English
    URL: Volltext  (URL des Erstveröffentlichers)
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  • 2
    UID:
    b3kat_BV044563985
    Format: 1 Online-Ressource (XV, 830 p. 297 illus., 194 illus. in color)
    ISBN: 9783319680255
    Additional Edition: Erscheint auch als Druck-Ausgabe ISBN 978-3-319-68024-8
    Language: English
    URL: Volltext  (URL des Erstveröffentlichers)
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  • 3
    Online Resource
    Online Resource
    Boca Raton :CRC Press/Taylor and Francis Group,
    UID:
    almahu_9949383529102882
    Format: 1 online resource.
    ISBN: 9781000691078 , 1000691071 , 9780429342363 , 0429342365 , 9781000690736 , 1000690733 , 9781000690903 , 1000690903
    Series Statement: Series in materials science and engineering ; 22
    Content: This book addresses advances in Chemical Vapor Deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. For each topic, the book discusses process, structure, properties, practical use, cost considerations, versatility, and sustainability. It presents a comprehensive overview of advances in CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Topics include basic principles, CVD of nanomaterials, and CVD of thin and thick films--
    Note: "A CRC title, part of the Taylor & Francis imprint, a member of the Taylor & Francis Group, the academic division of T&F Informa plc." , CVD of ultrafine particles -- CVD of nanowires and nanotubes, mass production and industrialization -- CVD of flat monolayer of 2D atomics honeycomb structure and their applications / Manoj Kumar Singh, Dhananjay K. Sharma, Gonzalo Otero-Irurueta and María J. Hortigüela -- CVD of superlattice films and their applications -- CVD of films and coating -- CVD of nanocomposite coatings / Yuri Zhuk and Kwang-Leong Choy -- Chemical vapour infiltration (CVI) of composites and their applications / Maria-Beatrice Coltelli and Andrea Lazzeri.
    Additional Edition: Print version: Chemical vapour deposition (CVD) Boca Raton : CRC Press/Taylor & Francis Group, [2019] ISBN 9781466597761
    Language: English
    Keywords: Electronic books. ; Electronic books.
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  • 4
    Online Resource
    Online Resource
    London :Imperial College Press,
    UID:
    edocfu_9959231785902883
    Format: 1 online resource (309 p.)
    ISBN: 1-281-86941-4 , 9786611869410 , 1-61583-239-4 , 1-86094-962-2
    Content: The use of advanced engineering ceramic films and powders for structural and functional applications is expanding rapidly. Improved materials and innovative methods of fabrication are needed to enhance the engineering performance and reduce the production costs. This book highlights innovative/cost-effective material-processing methods, at a mature production stage and also in development. In addition, issues and strategies associated with scaling-up are emphasized.
    Note: Based on an international conference on "Innovative/Cost-effective Materials Processing Methods", Imperial College, London, 6-7 July, 2000. , Preface; List of Contributors; CONTENTS; Chapter 1 Review of Advances in Processing Methods: Films and Nanocrystalline Powders; Chapter 3 Application of Pulsed Injection MOCVD to the Deposition of Oxide Single Layers and Superlattices; 1. Introduction; 2. Deposition of Oxide Films from the Metal-Organic Vapour Phase; 3. Experimental Set-up and Characterisation; 4. Results; 4.1. Oxide Films Grown by Pulsed Injection CVD; 4.2. Oxide Multilayered Structures Deposited by Pulsed Injection CVD; 5. Conclusions; References; Chapter 6 Hypersonic Plasma Particle Deposition of Nanocrystalline Coatings , 1. Introduction2. Experimental Apparatus; 3. Particle Synthesis; 3.1. Thermal Plasma Synthesis; 3.2. Particle Synthesis with a Thermal Plasma Expanded Through a Subsonic Nozzle; 4. Rationale for Operating in the Hypersonic Flow Regime; 5. Particle Synthesis with a Supersonically Expanded Plasma; 6. Film Deposition; 6.1. Apparatus and Operating Conditions; 6.2. Numerical Modelling of Flow and Particle Trajectories; 6.3. Experimental Results; 7. Film Post-Treatment; 8. Focused Nanoparticle Beam Deposition of Patterned Microstructures; 9. Summary and Conclusions; Acknowledgments; References , Chapter 7 Aerosol-Based Flame Synthesis: A Microreactor for Silica Nanoparticles1. Introduction; 2. Experimental; 3. Results and Discussion; 3.1. Jet Mixing; 3.2. Flame Characterization; 3.3. Nanoparticle Synthesis; 4. Conclusions; Acknowledgments; References; Chapter 9 Deposition of Electron Beam Evaporant in a Low Vacuum Gas Flow Environment; 1. Motivating Development of a New Vapor Deposition Technology; 2. Depositing Electron Beam Evaporant from a Gas Flow; 2.1. Vapor Creation Using an Electron Beam; 2.2. Vapor Transport in a Flowing Gas Stream; 2.3. Directed Vapour Deposition , 3. Experimental Study of ""Directed Vapour Deposition""3.1. Gas Flow Fundamentals; 3.2. Visualizing the Carrier Gas Flow; 3.3. Visualising the Interaction between Carrier Gas and Vapour Flows; 3.4. Deposition Efficiency at Constant e-beam Power; 3.5. Deposition Efficiency Under Constant Gas Flow Conditions; 4. Model-Based Study of ""Directed Vapour Deposition""; 4.1. Model Description; 4.2. Simulation of DVD Conditions; 5. Application of DVD to the Creation of Thermal Barrier Coatings; 6. Enhancing ""Directed Vapour Deposition"" , 7. Initial Results from a Second Generation of ""Directed Vapour Deposition""8. Conclusions; Acknowledgments; References; Index , English
    Additional Edition: ISBN 1-86094-316-0
    Language: English
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