@article{Fleischmann2000Struc-8911,
  year={2000},
  doi={10.1023/A:1004629612191},
  title={Structural stability of solid deuterium films},
  number={5-6},
  volume={119},
  journal={Journal of Low Temperature Physics},
  pages={615--625},
  author={Fleischmann, L. and Bonn, Jochen and Degen, Beate and Przyrembel, Michael and Otten, Ernst-Wilhelm and Weinheimer, Christian and Leiderer, Paul}
}

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    <dc:creator>Weinheimer, Christian</dc:creator>
    <dc:creator>Przyrembel, Michael</dc:creator>
    <dc:contributor>Bonn, Jochen</dc:contributor>
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    <dc:contributor>Otten, Ernst-Wilhelm</dc:contributor>
    <dc:creator>Otten, Ernst-Wilhelm</dc:creator>
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    <dcterms:bibliographicCitation>First publ. in: Journal of Low Temperature Physics 119 (2000), 5-6, pp. 615-625</dcterms:bibliographicCitation>
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    <dcterms:abstract xml:lang="eng">The wetting behavior of quenched-condensed solid D2 films has been investigated by means of light scattering. On the substrates used here (graphite and aluminum) molecular deuterium displays triple point wetting and hence dewets in the solid state, provided the temperature is high enough that thermally activated diffusion processes can take place. This manifests itself in a coarse-graining of the D2 film. In order to avoid this process and to obtain complete wetting of solid D2 we have modified the adsorbate-substrate interaction potential by preplating the substrates with thin inert layers of Ne, Ar, CH4 or C2H6 . The predicted change in the wetting properties was not observed, however, suggesting that the existing picture of triple point wetting of van der Waals systems is not complete. The implications of these results for a neutrino mass experiment where quenched-condensed molecular tritium films are used as a source are discussed.</dcterms:abstract>
    <dc:contributor>Degen, Beate</dc:contributor>
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    <dcterms:title>Structural stability of solid deuterium films</dcterms:title>
    <dc:contributor>Weinheimer, Christian</dc:contributor>
    <dcterms:issued>2000</dcterms:issued>
    <dc:contributor>Przyrembel, Michael</dc:contributor>
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