Abstract
We report etch-rate and probe-beam-deflection studies of N-BK7 glass ablated using a 157-nm F2 laser. It is found that controllable material removal at the nanometre level is possible above an ablation threshold of 250 mJ cm-2. Contact mask printing shows well-defined features can be micromachined in this glass with sub-micron resolution capability. Micro-features produced in this way have been replicated by polydimethylsiloxane (PDMS) moulding and the stamps used to print arrays of fluorescent molecules with sub-micron fidelity.
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45.55.Lt; 52.38.Mf; 87.80.Mj; 42.70.Ce
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Dyer , P., Maswadi , S., Walton , C. et al. 157-nm laser micromachining of N-BK7 glass and replication for microcontact printing. Appl Phys A 77, 391–394 (2003). https://doi.org/10.1007/s00339-002-1936-0
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DOI: https://doi.org/10.1007/s00339-002-1936-0