Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer

Deepak Bhandari; Ivan I Kravchenko; Nickolay V Lavrik; Michael J Sepaniak

doi:10.1021/ja201497a

Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer

J Am Chem Soc. 2011 May 25;133(20):7722-4. doi: 10.1021/ja201497a. Epub 2011 Apr 28.

Authors

Deepak Bhandari¹, Ivan I Kravchenko, Nickolay V Lavrik, Michael J Sepaniak

Affiliation

¹ Department of Chemistry, University of Tennessee, Knoxville, Tennessee 37996, USA.

PMID: 21526774
DOI: 10.1021/ja201497a

Abstract

This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.