UID:
almafu_9959326946602883
Format:
1 online resource (xviii, 369 pages) :
,
illustrations
ISBN:
9780470060193
,
0470060190
,
9780470060186
,
0470060182
Content:
Ellipsometry is a powerful tool used for the characterization of thin films and multi-layer semiconductor structures. This book deals with fundamental principles and applications of spectroscopic ellipsometry (SE). Beginning with an overview of SE technologies the text moves on to focus on the data analysis of results obtained from SE, Fundamental data analyses, principles and physical backgrounds and the various materials used in different fields from LSI industry to biotechnology are described. The final chapter describes the latest developments of real-time monitoring and process control wh.
Note:
Introduction to spectroscopic ellipsometry -- Principles of optics -- Polarization of light -- Principles of spectroscopic ellipsometry -- Data analysis -- Ellipsometry of anisotropic materials -- Data analysis examples -- Real-time monitoring by spectroscopic ellipsometry.
Additional Edition:
Fujiwara, Hiroyuki. Spectroscopic ellipsometry. Chichester, England ; Hoboken, NJ : John Wiley & Sons, ©2007 ISBN 9780470016084
Language:
English
Keywords:
Electronic books.
;
Electronic books.
;
Electronic books.
DOI:
10.1002/9780470060193
URL:
https://onlinelibrary.wiley.com/doi/book/10.1002/9780470060193
URL:
https://onlinelibrary.wiley.com/doi/book/10.1002/9780470060193
URL:
https://onlinelibrary.wiley.com/doi/book/10.1002/9780470060193
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