Format:
1 Online-Ressource (484 pages)
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illustrations
ISBN:
9780841215009
Series Statement:
ACS symposium series 579
Note:
"Developed from a symposium sponsored by the Polymers for Microelectronics and Photonics Group of the Society of Polymer Science, Japan, and the Division of Polymeric Materials: Science and Engineering, Inc., of the American Chemical Society, at the Polymers for Microelectronics 1993 Meeting, Kawasaki, Japan, November 15-19, 1993."
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Distributed in print by Oxford University Press
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Includes bibliographical references and index
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Photophysics, Photochemistry, and Photo-optical Effects in Polymer Solids /
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Photochemistry of Liquid-Crystalline Polymers /
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Dissociative Electron Capture of Polymers with Bridging Acid Anhydrides: Matrix Isolation Electron Spin Resonance Study /
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Luminescence Study of Ion-Irradiated Aromatic Polymers /
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New Directions in the Design of Chemically Amplified Resists /
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Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration /
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Importance of Donor—Acceptor Reactions for the Photogeneration of Acid in Chemically Amplified Resists /
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Acid Generation in Chemically Amplified Resist Films /
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Radiation-Induced Reactions of Onium Salts in Novolak /
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Polymeric Sulfonium Salts as Acid Generators for Excimer Laser Lithography /
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Application of Triaryl Phosphate to Photosensitive Materials: Photoreaction Mechanism of Triaryl Phosphate /
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Effect of Water on the Surface Insoluble Layer of Chemically Amplified Positive Resists /
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Thermal Properties of a Chemically Amplified Resist Resin /
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Modeling and Simulation of Chemically Amplified Resist Systems /
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Surface Imaging Using Photoinduced Acid-Catalyzed Formation of Polysiloxanes at Air—Polymer Interface /
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Surface Imaging for Applications to Sub-0.35-μm Lithography /
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Molecular Design of Epoxy Resins for Microelectronics Packaging /
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Uniaxial and In-Plane Molecular Orientation of Polyimides and Their Precursor as Studied by Absorption Dichroism of Perylenebisimide Dye /
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Novel Photosensitive Polyimide Precursor Based on Polyisoimide Using Nifedipine as a Dissolution Inhibitor /
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Photochemical Behavior of Nifedipine Derivatives and Application to Photosensitive Polyimides /
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Waveguiding in High-Temperature-Stable Materials /
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Rodlike Fluorinated Polyimide as an In-Plane Birefringent Optical Material /
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Preparation of Polyphenylene and Copolymers for Microelectronics Applications /
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Charge-Carrier Generation and Migration in a Polydiacetylene Compound: Studied by Pulse Radiolysis Time-Resolved Microwave Conductivity /
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Excitation Dynamics in Conjugated Polymers /
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Application of Polyaniline Films to Radiation Dosimetry /
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Present and Future of Fullerenes: C60 and Tubules /
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Photoresponsive Liquid-Crystalline Polymers: Holographic Storage, Digital Storage, and Holographic Optical Components /
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Azimuthal Alignment Photocontrol of Liquid Crystals /
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Electronic Structure and UV Absorption Spectra of Permethylated Silicon Chains /
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Electronic Properties of Polysilanes /
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UV Photoelectron Spectroscopy of Polysilanes and Polygermanes /
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Radical Ions of Polysilynes /
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Optical Properties of Silicon-Based Polymers with Different Backbone Structures /
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Synthesis and Properties of Polysilanes Prepared by Ring-Opening Polymerization /
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New Synthesis and Functionalization of Photosensitive Poly(silyl ether) by Addition Reaction of Bisepoxide with Dichlorosilane /
Additional Edition:
ISBN 9780841230552
Additional Edition:
Erscheint auch als ISBN 9780841230552
Additional Edition:
Erscheint auch als ISBN 0841230552
Language:
English
DOI:
10.1021/bk-1994-0579
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