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Umfang: 1 Online-Ressource (getrennte Seitenzählung)

Ausgabe: Version: 20201201

ISBN: 9780750326087 , 9780750326070

Serie: IOP ebooks

Inhalt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.

Weitere Ausg.: ISBN 9780750326063

Weitere Ausg.: ISBN 9780750326094

Weitere Ausg.: Erscheint auch als Druck-Ausgabe Nanofabrication Bristol : IOP Publishing, 2020 ISBN 9780750326063

Sprache: Englisch

DOI: 10.1088/978-0-7503-2608-7

URL: Volltext  (lizenzpflichtig)

URL: Volltext  (lizenzpflichtig)

UID:

Umfang: 1 online resource (450 pages)

Ausgabe: 1st ed.

ISBN: 9780750326087

Serie: IOP Ebooks Series

Inhalt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. Ideally suited for Master/PhD students who need a basic understanding of nanolithography techniques and their applications. The book also contains state-of-the-art information for researchers needing to expand their knowledge of nanofabrication.

Anmerkung: Intro -- Preface -- Acknowledgements -- Editor biography -- José Maria De Teresa -- List of contributors -- Chapter 1 Introduction to nanolithography techniques and their applications -- 1.1 Key concepts in nanolithography -- 1.1.1 Top-down versus self-assembly and self-organization processes -- 1.1.2 Resolution, cost, throughput and complexity -- 1.2 Nanolithography techniques using resists -- 1.2.1 Optical lithography (OL) -- 1.2.2 Electron beam lithography (EBL) -- 1.2.3 Nanoimprint lithography (NIL) -- 1.3 Direct nanolithography techniques -- 1.3.1 Focused ion beam (FIB) -- 1.3.2 Focused electron/ion beam induced deposition (FEBID and FIBID) -- 1.3.3 Scanning probe lithography (SPL) -- 1.4 Other nanolithography techniques and hybrid approaches -- 1.4.1 Stencil lithography -- 1.4.2 Nanosphere/colloidal lithography -- 1.4.3 Hybrid approaches -- 1.5 Comparison of nanolithography techniques -- 1.6 Applications of nanolithography techniques -- 1.6.1 Classical applications -- 1.6.2 Interdisciplinary applications -- 1.6.3 Emergent and future applications -- 1.7 End-of-chapter summary -- 1.8 Students' corner -- Acknowledgements -- References -- Chapter 2 Optical lithography -- 2.1 Concept of optical lithography -- 2.2 Optical lithography using optical masks -- 2.2.1 Optical lithography exposure modes and their resolution -- 2.2.2 Photo-resists -- 2.2.3 Extreme ultraviolet (EUV) optical lithography -- 2.3 Maskless optical lithography -- 2.3.1 Direct laser lithography -- 2.3.2 Two-photon lithography -- 2.4 Directed self-assembly (DSA) -- 2.4.1 Principles of DSA of block copolymers -- 2.4.2 Strategies for alignment of block copolymers -- 2.4.3 Applications -- 2.5 End-of-chapter summary -- 2.6 Student's corner -- References -- Chapter 3 Electron beam lithography and its use on 2D materials -- 3.1 Introduction -- 3.2 Fundamentals of EBL. , 3.2.1 Chamber and electron column -- 3.2.2 Basic and lift-off EBL processes -- 3.2.3 Resolution -- 3.2.4 Scan modes, writing field, DAC, stitching, beam stability -- 3.2.5 Resists -- 3.2.6 Cross-linking problem -- 3.3 Steps for a successful EBL process -- 3.3.1 Spin coating -- 3.3.2 EBL on a bare wafer (WA& -- #62 -- WF) -- 3.3.3 EBL in a wafer with alignment markers (WA< -- WF) -- 3.3.4 Two different resists: polymethylmethacrylate (PMMA) versus higher resolution hydrogen silsesquioxane (HSQ) -- 3.4 ICP-RIE and E-beam evaporation -- 3.4.1 ICP-RIE -- 3.4.2 E-beam metal evaporation -- 3.5 EBL applied to 2D materials -- 3.5.1 Hall bars in graphene heterostructures -- 3.5.2 Quantum point contacts defined by cryo-etching -- 3.5.3 Dual-gated graphene FETs -- 3.5.4 Hall bars in other 2D materials -- 3.6 General applications and new developments in EBL technique -- 3.7 End-of-chapter summary -- 3.8 Student's corner -- Acknowledgements -- References -- Chapter 4 Focused electron beam induced deposition -- 4.1 Introduction -- 4.2 Principles of FEBID -- 4.2.1 Electron-matter interaction -- 4.2.2 Monte Carlo method towards FEBID simulations -- 4.2.3 Single precursor species model -- 4.2.4 General features of FEBID precursors, growth parameters and applications -- 4.3 FEBID precursors and deposited materials -- 4.3.1 Precursors and properties of as-grown materials -- 4.3.2 Improving properties -- 4.4 Applications -- 4.5 Additional FEBID strategies and novel developments -- 4.6 End-of-chapter summary -- 4.7 Student's corner -- Acknowledgements -- References -- Chapter 5 Focused ion beam induced processing -- 5.1 Introduction -- 5.2 The instrument -- 5.2.1 Historical development -- 5.2.2 Ion sources -- 5.2.3 Ion column -- 5.2.4 Gas injection system -- 5.2.5 Process chamber and electron/ion detectors -- 5.2.6 Additional modules -- 5.3 Basics of FIB processing. , 5.3.1 Ion-solid interactions -- 5.3.2 Operating the beam -- 5.4 Milling and materials modification -- 5.4.1 Milling -- 5.4.2 FIB irradiation for materials modification -- 5.5 Focused ion beam induced deposition -- 5.5.1 Fundamentals -- 5.5.2 Applications of FIBID -- 5.6 Other applications of focused ion beams -- 5.6.1 FIB-based imaging -- 5.6.2 FIB-based tomography -- 5.6.3 Secondary-ion mass spectrometry -- 5.6.4 Current developments and future challenges -- 5.7 End-of-chapter summary -- 5.8 Students' corner -- Acknowledgements -- List of acronyms -- References -- Chapter 6 Scanning probe lithography -- 6.1 Introduction: from atomic-scale modifications to scanning probe lithography -- 6.2 Oxidation SPL -- 6.2.1 Key aspects of o-SPL -- 6.2.2 Nanolithography -- 6.2.3 Beyond oxidation processes -- 6.3 Thermal SPL -- 6.3.1 Key aspects of t-SPL -- 6.3.2 Nanolithography -- 6.4 Deposition SPL -- 6.4.1 Key aspects of deposition SPL -- 6.4.2 Nanolithography -- 6.5 Other SPL methods -- 6.6 End-of-chapter summary -- 6.7 Student's corner -- Acknowledgments -- References -- Chapter 7 Soft thermal nanoimprint and hybrid processes to produce complex structures -- 7.1 Fundamentals of nanoimprint processes -- 7.1.1 Introduction -- 7.1.2 Basic nanoimprint processes and variants -- 7.2 Soft thermal nanoimprint lithography (soft T-NIL) -- 7.2.1 Thermoplastic polymers for soft T-NIL -- 7.2.2 Molds for soft T-NIL -- 7.3 Complex structures by soft thermal nanoimprint and hybrid processes -- 7.3.1 Introduction -- 7.3.2 High-aspect ratio imprinting -- 7.3.3 Multilevel hierarchical complex nanoimprinting -- 7.4 End-of-chapter summary -- 7.5 Student's corner -- References -- Chapter 8 Stencil lithography -- 8.1 Introduction -- 8.1.1 Brief history of stencil in micropatterning -- 8.1.2 Why is stencil lithography interesting? -- 8.1.3 Why is stencil lithography challenging?. , 8.2 Fabrication of stencil membranes -- 8.2.1 Membrane material -- 8.2.2 Fabrication steps -- 8.2.3 Membrane reinforcement -- 8.3 Challenges of stencil lithography -- 8.3.1 Blurring -- 8.3.2 Shadowing -- 8.3.3 Clogging -- 8.3.4 Cracking and bending -- 8.4 Design considerations -- 8.4.1 Process as collimated as possible -- 8.4.2 Thin but robust membranes -- 8.4.3 Durable material (both mechanically and chemically) -- 8.4.4 Surface treatment -- 8.4.5 Reducing gap -- 8.5 Alignment -- 8.6 Dynamic stencil -- 8.7 Applications -- 8.8 End of chapter summary -- 8.9 Student's corner -- Acknowledgements -- References -- Chapter 9 Ice lithography -- 9.1 Introduction and historical perspective -- 9.2 Fundamentals -- 9.2.1 Energetic electrons -- 9.2.2 Ices, condensed gases in vacuum -- 9.2.3 Electron-ice interactions -- 9.2.4 Summary -- 9.3 Lithography using electrons and ices -- 9.3.1 Ice lithography process -- 9.3.2 Ice lithography resist -- 9.3.3 Ice lithography instrument -- 9.4 Applications -- 9.4.1 Nanofabrication on 3D structures -- 9.4.2 Nanofabrication on fragile structures -- 9.4.3 Rapid prototyping -- 9.4.4 High-resolution patterning -- 9.5 Future research, opportunities and challenges -- 9.5.1 Fundamental science research -- 9.5.2 Icetronics research -- 9.5.3 Applications -- 9.6 End-of-chapter summary -- 9.7 Student's corner -- References -- Chapter 10 Magnetic nanopatterning via thermal scanning probe lithography -- 10.1 Introduction -- 10.2 Thermally-assisted magnetic scanning probe lithography -- 10.2.1 Concept -- 10.2.2 Patterning magnetic domains, domain walls and solitons -- 10.2.3 Writing spin textures in synthetic antiferromagnets -- 10.2.4 Features and capabilities of tam-SPL -- 10.3 Nanopatterned spin textures for magnonics -- 10.3.1 Controlling the spin-wave excitation and propagation with magnetic domains. , 10.3.2 Nanoscale spin-wave circuits based on spin textures -- 10.3.3 Optically inspired nanomagnonics in synthetic antiferromagnets -- 10.4 End-of-chapter summary -- 10.5 Student's corner -- Acknowledgements -- References -- Chapter 11 Nanofabrication of three-dimensional magnetic structures -- 11.1 Introduction -- 11.1.1 3D magnetic nanostructures for the future -- 11.2 Overview of nanofabrication techniques for magnetism -- 11.3 Direct-write techniques for 3D nanofabrication of magnetic materials -- 11.4 Focused electron beam induced deposition -- 11.4.1 FEBID for magnetism -- 11.4.2 FEBID fundamentals -- 11.4.3 FEBID resolution -- 11.4.4 FEBID theory, modelling and practical recommendations -- 11.4.5 FEBID: 3D nanopatterning algorithms -- 11.4.6 FEBID and thin film deposition: hybrid approach for 3D nanopatterning -- 11.5 Two-photon lithography -- 11.5.1 Two-photon lithography for 3D nanomagnetism -- 11.5.2 Examples of scaffold lithography using two-photon lithography -- 11.6 Electrodeposition of 3D materials -- 11.6.1 Electrodeposition for 3D nanomagnetism -- 11.6.2 Electrodeposition of nanowires -- 11.6.3 Nanostructured multilayered nanowires -- 11.6.4 Electrodeposition of complex structures -- 11.7 End-of-chapter summary -- 11.8 Student's corner -- References -- Chapter 12 FEBIP for functional nanolithography of 2D nanomaterials -- 12.1 Introduction -- 12.2 Atomic manipulation of 2D nanomaterials -- 12.2.1 Defect engineering of 2D nanomaterials -- 12.2.2 Directing matter: atomic forging with in situ imaging and material manipulations -- 12.3 Directed surface and interface modification of graphene-based nanomaterials using focused electron beam and precursor molecules -- 12.3.1 Graphene oxide -- 12.3.2 Other members of graphene-based nanomaterials -- 12.4 Focused electron beam induced etching (FEBIE) of 2D nanomaterials. , 12.5 Applications of the FEBIP techniques to 2D nanomaterial-based electronic devices.

Weitere Ausg.: Print version: De Teresa, José María Nanofabrication Bristol : Institute of Physics Publishing,c2020 ISBN 9780750326094

Sprache: Englisch

Schlagwort(e): Electronic books.

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UID:

Umfang: 1 online resource (various pagings) : , illustrations (some color).

ISBN: 9780750326087 , 9780750326070

Serie: IOP ebooks. [2020 collection]

Inhalt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.

Anmerkung: "Version: 20201201"--Title page verso. , 1. Introduction to nanolithography techniques and their applications / José María De Teresa -- 2. Optical lithography / Francesc Perez-Murano, José Ignacio Martín and José María De Teresa -- 3. Electron beam lithography and its use on 2D materials / Vito Clericò, Mario Amado and Enrique Diez -- 4. Focused electron beam induced deposition / Javier Pablo-Navarro, Soraya Sangiao, César Magén and José María De Teresa -- 5. Focused ion beam induced processing / Pablo Orús, Rosa Córdoba and José María De Teresa -- 6. Scanning probe lithography / Ricardo Garcia -- 7. Soft thermal nanoimprint and hybrid processes to produce complex structures / Isabel Rodríguez and Jaime Hernández -- 8. Stencil lithography / Oscar Vazquez-Mena and Luis Guillermo Villanueva -- 9. Ice lithography / Anpan Han, Ding Zhao and Min Qiu -- 10. Magnetic nanopatterning via thermal scanning probe lithography / Edoardo Albisetti, Daniela Petti, Riccardo Bertacco and Elisa Riedo -- 11. Nanofabrication of three-dimensional magnetic structures / Dédalo Sanz-Hernández, Claire Donnelly, Lucas Pérez and Amalio Fernández-Pacheco -- 12. FEBIP for functional nanolithography of 2D nanomaterials / Songkil Kim and Andrei G. Fedorov. , Also available in print. , Mode of access: World Wide Web. , System requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader.

Weitere Ausg.: Print version: ISBN 9780750326063

Weitere Ausg.: ISBN 9780750326094

Sprache: Englisch

DOI: 10.1088/978-0-7503-2608-7

URL: https://iopscience.iop.org/book/978-0-7503-2608-7