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  • 1
    Book
    Book
    Cambridge : Cambridge University Press
    UID:
    b3kat_BV047515928
    Format: xxvii, 597 Seiten , Illustrationen, Diagramme
    Edition: Third edition
    ISBN: 9781108480024 , 1108480020
    Content: "A thoroughly updated third edition of a classic and widely adopted text, perfect for practical transistor design and in the classroom. Covering a variety of recent developments, the internationally renowned authors discuss in detail the basic properties and designs of modern VLSI devices, as well as factors affecting performance. Containing around 25% new material, coverage has been expanded to include high-k gate dielectrics, metal gate technology, strained silicon mobility, non-GCA (Gradual Channel Approximation) modelling of MOSFETs, shortchannel FinFETS, and symmetric lateral bipolar transistors on SOI. Chapters have been reorganized to integrate the appendices into the main text to enable a smoother learning experience, and numerous additional end-of-chapter homework exercises (+30%) are included to engage students with real-world problems and test their understanding. A perfect text for senior undergraduate and graduate students taking advanced semiconductor devices courses, and for practicing silicon device professionals in the semiconductor industry"--
    Additional Edition: Erscheint auch als Online-Ausgabe, EPUB ISBN 9781108847087
    Language: English
    Subjects: Engineering
    RVK:
    RVK:
    Keywords: VLSI ; Entwurf ; CMOS
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    Online Resource
    Online Resource
    Cambridge ; New York :Cambridge University Press,
    UID:
    almafu_9961294046402883
    Format: 1 online resource (xx, 597 pages) : , digital, PDF file(s).
    Edition: Third edition.
    ISBN: 1-108-84805-2 , 1-108-84708-0
    Content: A thoroughly updated third edition of an classic and widely adopted text, perfect for practical transistor design and in the classroom. Covering a variety of recent developments, the internationally renowned authors discuss in detail the basic properties and designs of modern VLSI devices, as well as factors affecting performance. Containing around 25% new material, coverage has been expanded to include high-k gate dielectrics, metal gate technology, strained silicon mobility, non-GCA (Gradual Channel Approximation) modelling of MOSFETs, short-channel FinFETS, and symmetric lateral bipolar transistors on SOI. Chapters have been reorganized to integrate the appendices into the main text to enable a smoother learning experience, and numerous additional end-of-chapter homework exercises (+30%) are included to engage students with real-world problems and test their understanding. A perfect text for senior undergraduate and graduate students taking advanced semiconductor devices courses, and for practicing silicon device professionals in the semiconductor industry.
    Note: Title from publisher's bibliographic system (viewed on 27 Jan 2022).
    Additional Edition: ISBN 1-108-48002-0
    Language: English
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
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