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  • 1
    UID:
    gbv_749183810
    Format: Online-Ressource (XIII, 363 p) , digital
    Edition: Springer eBook Collection. Chemistry and Materials Science
    ISBN: 9789401003537
    Series Statement: NATO Science Series, Series II: Mathematics, Physics and Chemistry 55
    Content: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics
    Additional Edition: ISBN 9781402005251
    Additional Edition: Erscheint auch als Druck-Ausgabe ISBN 9781402005251
    Additional Edition: Erscheint auch als Druck-Ausgabe ISBN 9781402005244
    Additional Edition: Erscheint auch als Druck-Ausgabe ISBN 9789401003544
    Language: English
    URL: Volltext  (lizenzpflichtig)
    Library Location Call Number Volume/Issue/Year Availability
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  • 2
    UID:
    almahu_9949198880502882
    Format: XIII, 363 p. , online resource.
    Edition: 1st ed. 2002.
    ISBN: 9789401003537
    Series Statement: NATO Science Series II: Mathematics, Physics and Chemistry, Mathematics, Physics and Chemistry ; 55
    Content: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
    Note: Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems -- Self-Assembled Electroactive Ultrathin Films -- Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials -- Sol-Gel Deposition Processes of Thin Ceramic Films -- Thin Film Deposition By Sol-Gel And CVD Processing of Metal-Organic Precursors -- Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes -- Chemical Vapor Deposition of Superconductor and Oxide Films -- Selective Chemical Vapor Deposition -- Photochemical Vapour Deposition of Thin Films -- Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures -- Proximal Probe Induced Chemical Processing for Nanodevice Elaboration -- Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms -- Deposition of Thin Films By Sputtering -- Mass-Transport in an Austenitic Stainless Steel Under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature.
    In: Springer Nature eBook
    Additional Edition: Printed edition: ISBN 9781402005251
    Additional Edition: Printed edition: ISBN 9781402005244
    Additional Edition: Printed edition: ISBN 9789401003544
    Language: English
    Library Location Call Number Volume/Issue/Year Availability
    BibTip Others were also interested in ...
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