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  • 1
    Online-Ressource
    Online-Ressource
    Norwich, New York, U.S.A. : William Andrew Publishing | Heidelberg, Germany : Springer
    UID:
    b3kat_BV047235857
    Umfang: 1 Online-Ressource
    ISBN: 9783540274704
    Weitere Ausg.: Erscheint auch als Druck-Ausgabe ISBN 0-8155-1501-4
    Weitere Ausg.: Erscheint auch als Druck-Ausgabe ISBN 3-540-21938-2
    Sprache: Englisch
    Fachgebiete: Physik
    RVK:
    Schlagwort(e): Festkörper ; Diffusion ; Hochleistungswerkstoff ; Diffusion
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 2
    Online-Ressource
    Online-Ressource
    Berlin, Heidelberg :Springer Berlin Heidelberg :
    UID:
    almafu_9958094254802883
    Umfang: 1 online resource (542 p.)
    Ausgabe: 1st ed. 2005.
    ISBN: 1-283-25060-8 , 9786613250605 , 3-540-27470-7
    Inhalt: My 12-year-old granddaughter Nina Alesi once asked me, "Grandpa, you are a scientist at IBM, so what do you do?" I tried to reply, "Oh, I watch atoms move. . . " But before I could finish this sentence, my 7-year-old grandson Vinnie interjected, "Grandpa, do atoms play soccer?" This book is about the games atoms play in diffusion and various other properties of materials. While diffusion has been studied for more than 100 years in solids, its importance, excitement, and intellectual chal­ lenges remain undiminished with time. It is central to understanding the relationship between the structure and properties of naturally occurring and synthetic materials, which is at the root of current technological development and innovations. The diversity of material has led to spec­ tacular progress in functional inorganics, polymers, granular materials, photonics, complex oxides, metallic glasses, quasi-crystals, and strongly correlated electronic materials. The integrity of complex materials pack­ ages is determined by diffusion, a highly interactive and synergic phe­ nomenon that interrelates to the microstructure, the microchemistry, and the superimposed physical fields. While the various physico-chemical properties of the materials are affected by diffusion, they determine diffu­ sion itself. This book, which is intended to document the diffusive processes operative in advanced technological materials, has been written by pio­ neers in industry and academia.
    Anmerkung: Description based upon print version of record. , Diffusion in Bulk Solids and Thin Films: Some Phenomenological Examples -- Solid State Diffusion and Bulk Properties -- Atomistic Computer Simulation of Diffusion -- Bulk and Grain Boundary Diffusion in Intermetallic Compounds -- Diffusion Barriers in Semiconductor Devices/Circuits -- Reactive Phase Formation: Some Theory and Applications -- Metal Diffusion in Polymers and on Polymer Surfaces -- Measurement of Stresses in Thin Films and Their Relaxation -- Electromigration in Cu Thin Films -- Diffusion in Some Perovskites: HTSC Cuprates and a Piezoelectric Ceramic.
    Weitere Ausg.: ISBN 3-642-06019-6
    Weitere Ausg.: ISBN 3-540-21938-2
    Sprache: Englisch
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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  • 3
    Online-Ressource
    Online-Ressource
    Berlin, Heidelberg : Springer-Verlag Berlin Heidelberg
    UID:
    gbv_1649764499
    Umfang: Online-Ressource (XVIII, 532 p, digital)
    ISBN: 9783540274704
    Serie: SpringerLink
    Inhalt: This book documents diffusion processes and various other properties operative in advanced technological materials. Diffusion in functional organic chemicals, polymers, granular materials, complex oxides, metallic glasses, and quasi-crystals among other advanced materials is a highly interactive and synergic phenomenon. A large variety of atomic arrangements are possible. Each arrangement affects the performance of these advanced, polycrystalline multiphase materials used in photonics, MEMS, electronics, and other applications of current and developing interest. This book is written by pioneers in industry and academia for engineers, chemists, and physicists in industry and academia at the forefront of today's challenges in nanotechnology, surface science, materials science, and semiconductors.
    Anmerkung: Description based upon print version of record , Title Page; Copyright Page; Dedication; Table of Contents; Contributors; Preface; 1 Diffusion in Bulk Solids and Thin Films: Some Phenomenological Examples; 1.1 Introduction; 1.2 Diffusion in Single Crystals; 1.3 Structurally Inhomogeneous Samples; 1.4 Some Illustrative Experimental Data; 1.5 General Characteristics of Grain Boundary Diffusion; 1.6 Diffusion in Quasicrystalline and Amorphous Alloys; 1.7 Summary; Acknowledgment; References; 2 Solid State Diffusion and Bulk Properties; 2.1 Introduction; 2.2 Correlations with Bulk Properties , 2.3 Equilibrium Thermodynamic Calculation of Diffusion Parameters2.4 Summary; Acknowledgment; Appendix 2A. Taylor Series Expansion of ?G*; Appendix 2B. Evaluation of Errors in Estimated Parameters; References; 3 Atomistic Computer Simulation of Diffusion; 3.1 Introduction; 3.2 Atomic Interaction Models; 3.3 Molecular Statics; 3.4 Harmonic Approximation; 3.5 Equilibrium Defect Concentrations; 3.6 Transition Rate Calculations; 3.7 Kinetic Monte Carlo Simulations; 3.8 Molecular Dynamics; 3.9 Conclusions; Acknowledgment; References; 4 Bulk and Grain Boundary Diffusion in Intermetallic Compounds , 4.1 Introduction4.2 Crystal Structures and Point Defects in Ni, Ti, and Fe Aluminides; 4.3 Diffusion Mechanisms in Intermetallics; 4.4 Experimental Results on Bulk Diffusion in Ordered Aluminides; 4.5 Discussion of Lattice Diffusion in Intermetallics; 4.6 Grain Boundary Diffusion; 4.7 Summary; Acknowledgments; References; 5 Diffusion Barriers in Semiconductor Devices/Circuits; 5.1 Introduction; 5.2 Diffusion Barriers from the 1960s Through the 1990s; 5.3 Brief Review of Diffusion and the Influencing Material Factors; 5.4 Diffusion Barrier Materials , 5.5 New Concepts in Affecting APDB Behavior at the Interfaces5.6 Brief Discussion of an APDB for LOW-k ILD Materials; 5.7 Summary; Reference; 6 Reactive Phase Formation: Some Theory and Applications; 6.1 Introduction; 6.2 Theoretical Considerations; 6.3 Practical Problems in Electronic Technology; 6.4 Conclusions; Acknowledgments; References; 7 Metal Diffusion in Polymers and on Polymer Surfaces; 7.1 Introduction; 7.2 Diffusion During Nucleation and Growth of Metal Films on Polymers; 7.3 Metal-Polymer Interaction; 7.4 Diffusion in the Polymer Bulk; 7.5 Summary and Conclusions; Acknowledgments , References8 Measurement of Stresses in Thin Films and Their Relaxation; 8.1 Introduction; 8.2 MeasurementTechniques; 8.3 Stress Relaxation; 8.4 Conclusion; References; 9 Electromigration in Cu Thin Films; 9.1 Introduction; 9.2 Cu Interconnection Integration; 9.3 Test Structure and Experiment; 9.4 Microstructure; 9.5 Theory; 9.6 Resistance and Void Growth; 9.7 Fast Diffusion Paths; 9.8 Lifetime Distribution; 9.9 Current Density Dependence; 9.10 Lifetime vs. Linewidth; 9.11 Lifetime Scaling Rule; 9.12 Short-Length Effect; 9.13 Reduced Cu Interface Diffusion; 9.14 Conclusion; References , 10 Diffusion in Some Perovskites: HTSC Cuprates and a Piezoelectric Ceramic
    Weitere Ausg.: ISBN 9783540219385
    Weitere Ausg.: Buchausg. u.d.T. Diffusion processes in advanced technological materials Norwich, NY : William Andrew, 2005 ISBN 0815515014
    Weitere Ausg.: ISBN 3540219382
    Sprache: Englisch
    Fachgebiete: Technik
    RVK:
    Schlagwort(e): Festkörper ; Diffusion ; Hochleistungswerkstoff ; Diffusion ; Festkörper ; Diffusion ; Hochleistungswerkstoff
    URL: Volltext  (lizenzpflichtig)
    URL: Cover
    Bibliothek Standort Signatur Band/Heft/Jahr Verfügbarkeit
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