UID:
almafu_9961024850102883
Ausgabe:
1st ed.
ISBN:
9789175191928
Inhalt:
This thesis explores the early stages of thin film deposition, focusing on the nanoscale processes involved in the growth of metal films on insulating, amorphous substrates. Utilizing kinetic Monte Carlo simulations, the study investigates island nucleation, growth, and coalescence under different vapor flux conditions. The research identifies two distinct growth regimes and examines the elongation transition in relation to vapor flux, adatom diffusivity, and coalescence rates. Experimental results for silver growth on amorphous SiO2 validate the theoretical findings. The work aims to enhance the understanding of thin film growth mechanisms to enable the tailoring of films for specific technological applications. It is intended for researchers and professionals in materials science and nanotechnology.
Anmerkung:
ABSTRACT -- PREFACE -- APPENDED PAPERS -- AUTHOR’S CONTRIBUTION TO APPENDED PAPERS -- ACKNOWLEDGEMENTS -- TABLE OF CONTENTS -- 1 INTRODUCTION -- 2 THIN FILM GROWTH -- 3 KINETIC MONTE CARLO SIMULATIONS -- 4 EXPERIMENTAL TECHNIQUES -- 5 SUMMARY OF PAPERS -- 6 FUTURE OUTLOOK -- REFERENCES
Sprache:
Englisch
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