In:
Advanced Materials Interfaces, Wiley, Vol. 8, No. 13 ( 2021-07)
Abstract:
The chemical presence of the MoO x species on single microscopic MoS 2 flakes is shown at two conditions, which are of interest for future MoS 2 ‐based devices and where their presence is not previously confirmed. First, the case of thick MoS 2 flakes oxidatively etched at 350–370 °C in air is treated. Atomic force microscopy (AFM), high resolution X‐ray photoelectron spectroscopy, and X‐ray absorption spectroscopy are combined to unambiguously confirm the chemical presence of the α‐MoO 3 species on such samples, mostly in the form of loose particles. Second, it is shown that MoS 2 flakes heated at temperatures of only 220 °C display a quite uniform ≈2 nm thick MoO x layer at already 10% relative humidity. The presence of such MoO x oxide layers is confirmed by scratching the sample with AFM tips and performing comparative Kelvin probe force microscopy and Auger photoelectron spectroscopy on scratched‐out and untouched parts of the flakes.
Type of Medium:
Online Resource
ISSN:
2196-7350
,
2196-7350
DOI:
10.1002/admi.202100328
Language:
English
Publisher:
Wiley
Publication Date:
2021
detail.hit.zdb_id:
2750376-8