In:
Angewandte Chemie International Edition, Wiley, Vol. 56, No. 24 ( 2017-06-06), p. 6749-6752
Abstract:
A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.
Type of Medium:
Online Resource
ISSN:
1433-7851
,
1521-3773
DOI:
10.1002/anie.201700224
Language:
English
Publisher:
Wiley
Publication Date:
2017
detail.hit.zdb_id:
2011836-3
detail.hit.zdb_id:
123227-7
