In:
Chemical Vapor Deposition, Wiley, Vol. 21, No. 4-5-6 ( 2015-06), p. 150-155
Kurzfassung:
C‐Tb 2 O 3 films are deposited on Si(100) substrates from a vapor of Tb(thd) 3 under an inert atmosphere. The sesquioxide films are transformed to higher oxide films under annealing in air. Some optical characteristics are obtained for the films before and after annealing in air and compared with the known values.
Materialart:
Online-Ressource
ISSN:
0948-1907
,
1521-3862
DOI:
10.1002/cvde.v21.4-5-6
DOI:
10.1002/cvde.201507153
Sprache:
Englisch
Verlag:
Wiley
Publikationsdatum:
2015
ZDB Id:
1477693-5