In:
Applied Physics Letters, AIP Publishing, Vol. 75, No. 17 ( 1999-10-25), p. 2587-2589
Abstract:
We have studied the indium incorporation into InGaN ternary alloys during low-pressure metalorganic vapor-phase epitaxy as a function of the trimethylindium flow and the growth temperature in the 800–860 °C range. Partially relaxed InxGa1−xN bulk films with indium compositions 0.02≲x≲0.14 have been grown. In relation to the band-gap energy at room temperature, determined by photothermal deflection spectroscopy, we find a downward band-gap bowing of 2.65±0.15 eV. The required change of the trimethylindium flow as a function of the growth temperature, necessary to obtain isocomposition InGaN films, can be described by an Arrhenius law. We find an indium desorption energy of 0.8±0.3 eV.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
1999
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
