In:
Journal of Applied Physics, AIP Publishing, Vol. 110, No. 8 ( 2011-10-15)
Kurzfassung:
Changes in the electron trapping at the interface between Ge substrates and LaGeOx films grown by atomic O assisted molecular beam deposition are inferred upon post deposition annealing treatment on the as-deposited films from electrically detected magnetic resonance (EDMR) spectroscopy and from the electrical response of Pt/LaGeOx/Ge metal oxide semiconductor (MOS) capacitors. The improved electrical performance of the MOS capacitors upon annealing is consistent with the EDMR detected reduction of oxide defects which are associated with GeO species in the LaGeOx layer as evidenced by x-ray photoelectron spectroscopy.
Materialart:
Online-Ressource
ISSN:
0021-8979
,
1089-7550
Sprache:
Englisch
Verlag:
AIP Publishing
Publikationsdatum:
2011
ZDB Id:
220641-9
ZDB Id:
3112-4
ZDB Id:
1476463-5
