In:
Applied Physics Letters, AIP Publishing, Vol. 35, No. 12 ( 1979-12-15), p. 920-922
Abstract:
Electron attachment to F2 and NF3 has been studied in an electron-beam-controlled gas-discharge apparatus over a range of E/P (2–10 kV/cm atm). These experiments were performed in gas mixtures containing small amounts of the halide molecules (≲1%) in an atmosphere of N2 which was included to control the average electron energy. We obtained values for the rate constants for dissociative attachment to F2 and NF3 as a function of mixture temperature at 300 and 500 °K and applied electric field. These results compare favorably with the rate constants deduced from the absolute cross section for these compounds reported by Chantry.
Type of Medium:
Online Resource
ISSN:
0003-6951
,
1077-3118
Language:
English
Publisher:
AIP Publishing
Publication Date:
1979
detail.hit.zdb_id:
211245-0
detail.hit.zdb_id:
1469436-0
