In:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, American Vacuum Society, Vol. 20, No. 2 ( 2002-03-01), p. 696-703
Kurzfassung:
A technique is described that uses radiation and a gas-phase species to produce a protective carbon coating on extreme ultraviolet (EUV) optics. A specific example is given in which a ∼5 Å carbon coating is deposited on EUV Mo/Si optics via coexposure to radiation (EUV photons, electrons) and ethanol vapor. Auger electron spectroscopy, sputter Auger depth profiling, and EUV reflectivity measurements are presented that suggest a carbon coating that is substantially void free and protects the optic from water-induced oxidation at the water partial pressures used in the tests (∼2×10−7 Torr). The coating is also resistant to atmospheric degradation, and to gasification by the combination of electrons and molecular oxygen. The protective coating reduces the relative reflectivity (ΔR/R0) of an optic by ∼0.5%.
Materialart:
Online-Ressource
ISSN:
1071-1023
,
1520-8567
Sprache:
Englisch
Verlag:
American Vacuum Society
Publikationsdatum:
2002
ZDB Id:
3117331-7
ZDB Id:
3117333-0
ZDB Id:
1475429-0
